Lucent Technologies Inc.

Aza E Mishkevich

Eliezer M Rabinovich

John Burnette MacChesney

Jerry Max Anderson

Henry Miles O'Bryan

Ofer Sneh

The specification describes sputtering processes for the deposition of silicon dioxide films doped with high levels of oxides or other materials to alter the optical and/or electrical characteristics of the films. Sol gel methods are used to prepare composite sputtering targets of ultra fine mixtures of materials so the composition of the sputtered films replicate the composition of the target.

Deposition of highly doped silicon dioxide films

The specification describes techniques for chemically machining extruded glass preforms used to draw glass ferrules for optical fiber connectors. Using the chemical machining technique the dimensions of the preform, including OD, ID, and the OD to ID ratio can be adjusted so that the dimensions of drawn ferrules meet strict dimensional standards. The technique is especially useful for adjusting the dimensions of extruded preforms that have an inherent bow along in the length of the preform. The technique allows adjustment in dimensions while preserving a desired OD to ID ratio. Also described are techniques for reducing eccentricity and/or ellipticity of hollow bore glass preforms.

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Bridgewater, NJ, United States of America

Aza E Mishkevich