Sony Corporation

Sony Group Corporation

Ayumu Taguchi

Hiroyuki Wada

Masahiro Yamada

Koichiro Kishima

Isao Ichimura

Hitoshi Tamada

Kazuhiro Nakagawa

Hideya Chubachi

Yutaka Imai

Shigeo Kubota

Kenji Ikeda

Makoto Takatoku

Noriyuki Kishii

Yuichi Aki

Nobuhiko Umezu

Hiroto Kasai

Koichi Tatsuki

Yukiyasu Sugano

Masato Nishida

Tadashi Hattori

Yasuyuki Ito

Tetsuo Abe

Yoshimi Hirata

Keiichi Maeda

Akifumi Ooshima

Sakiko Yasukawa

A fluorescence observation apparatus includes an irradiation unit that applies a plurality of kinds of excitation light of mutually different wavelengths to a plurality of spatially or temporally different positions in a biological sample that is labeled with a composite phosphor containing two or more kinds of fluorescent molecules at a predetermined composition ratio, a detection unit that detects fluorescence generated at each of the plurality of positions by application of the irradiation unit, and a calculation unit that determines a distribution of pieces of the composite phosphor on the basis of a fluorescence signal that is obtained from a detection result of the detection unit and that shows a fluorescence intensity corresponding to a position in the biological sample of each piece of the fluorescence.

Fluorescence observation apparatus, fluorescence observation system, and fluorescence observation method

Provided is an information processing apparatus () including: an image acquiring unit () that acquires captured image information of a sample () dyed with a fluorescent dye reagent (), an information acquiring unit () that acquires information related to the fluorescent dye reagent (), a correcting unit () that corrects the luminance of the captured image information using a fluorescence fading coefficient that represents the rapidness at which the fluorescence intensity of the fluorescent dye reagent () drops, the fluorescence fading coefficient being included in the fluorescent dye reagent (), and a calculating unit () that calculates information corresponding to fluorescent molecules in the captured image information, using the corrected luminance.

Information processing apparatus, information processing method, information processing system, and computer program

It is possible to more appropriately perform fluorescence separation. An information processing apparatus according to an embodiment includes: a fluorescence signal acquisition unit () that acquires a plurality of fluorescence spectra corresponding to each of a plurality of excitation lights having different wavelengths and irradiated to a fluorescence stained specimen (), the fluorescence stained specimen () being created by staining a specimen () with a fluorescence reagent (); a link unit () that generates a linked fluorescence spectrum by linking at least parts of the plurality of fluorescence spectra to each other in a wavelength direction; a separation unit () that separates the linked fluorescence spectrum into spectra for every fluorescent substance using a reference spectrum including a linked autofluorescence reference spectrum in which spectra of autofluorescent substances in the specimen are linked to each other in the wavelength direction and a linked fluorescence reference spectrum in which spectra of fluorescent substances in the fluorescence stained specimen are linked to each other in the wavelength direction; and an extraction unit () that updates the linked autofluorescence reference spectrum using the spectra for every fluorescent substance separated by the separation unit.

Information processing apparatus and microscope system

[Object] To provide an image sensor having high light collection efficiency and less crosstalk among pixels, a production method therefor, and an inspection apparatus. [Solving means] In an image sensor including a light source conversion unit that includes a plurality of light-receiving devices and converts incident light into an electric signal, a plurality of lenses that are provided in an immediately-above area of the light-receiving devices and collect light toward a light-receiving unit of the light-receiving devices positioned right below the lenses, and an insulation layer that is formed of an optically-transparent material and formed above the lenses, detection areas are provided on a surface of the insulation layer while being apart from one another for each of the light-receiving devices, a center of each of the detection areas being positioned on an extended line connecting a center of the light-receiving unit of each of the light-receiving devices and a center of the lens provided right above each of the light-receiving devices. In addition, a sample as a detection target is fixed to at least the detection areas.

Image sensor, production method therefor, and inspection apparatus

Disclosed herein is an object detection system including, a light radiation section, a light sweeping block, a light reflection body, a reflected-light detection section, and a reflected-light analysis section.

Object detection system and object detection method

A diffraction grating light modulator composed of a plurality of diffraction grating light modulating elements formed on a substrate, each consisting of a lower electrode, belt-like fixed electrodes and movable electrodes supported above the lower electrode, and exposed connecting terminals (for electrical connection to external circuits) electrically connected to the movable electrodes, the fixed electrodes and the movable electrodes constituting a diffraction grating upon application of a voltage to the lower electrode, the diffraction grating light modulator having a protective electrode surrounding the connecting terminals, so that the diffraction grating light modulating element is certainly protected from damage by static electricity.

Aggregate of electronic device chips, electronic device chip, aggregate of diffraction grating light modulators, and diffraction grating light modulator

An optical modulation device is disclosed which can suppress production of a cause of degradation such as a void or hillock on a light illumination surface thereof and can be incorporated in an image display apparatus of a small size and a high luminance to improve the reliability of the same. The optical modulation device includes first and second surface elements movable relative to each other to form different diffraction gratings to modulate light inputted thereto. Each of the first and second surface elements has a light illumination surface made of an AlCu alloy material. The optical modulation device has an airtight sealed space in which surrounding gas for the first and second surface elements is encapsulated. The surrounding gas contains hydrogen gas or helium gas or both of hydrogen gas and helium gas.

Optical modulation device and image display apparatus using the same

A light reflection and diffraction element for enhancing the contrast of an image display device. In an off state of the element, a portion exhibiting a cyclic structure for diffracting incident light in a region where reflective members having reflection surfaces are aligned is reduced by preventing the generation of unrequired diffracted light. For example, by covering connection regions of the ribbon reflective members by light shielding masks, incident light is shielded. Preferably, any uneven state of the reflection surfaces of the ribbon reflective members is controlled, and a correlation length is made small.

Light reflection/diffraction device, light reflection/diffraction device array, and image display

The state of a polysilicon film formed by excimer laser annealing an amorphous silicon film is to be evaluated. When the amorphous silicon film is annealed to form a polysilicon film, linearity or periodicity presents itself in the spatial structure of the film surface of the polysilicon film formed depending on the energy applied to the amorphous silicon during annealing. This linearity or periodicity is processed as an image and represented numerically from the image by exploiting the linearity or periodicity. The state of the polysilicon film is checked based on the numerical results.

Polysilicon evaluating method, polysilicon inspection apparatus and method for preparation of thin film transistor

Providing an electrostatic machine element for restraining deteriorations of practical electrostatic forces between electrodes by an electrostatic shielded effect to prevent instability of an electrode operation, a light diffraction modulation element using the electrostatic machine element and an image display device using the light diffraction modulation element. An edge and an upper side of a first electrode are opened and a dielectric material, the mobility of which depends on a polarity of an electric charge, is used for a second dielectric film. When a drive voltage such that the electric charge having high mobility moves from one dielectric film to another dielectric film, is applied between the first electrode and a second electrode, a charged particle that arrived at the first dielectric film moves further to the upper side of the first electrode.

Electrostatic machine element, light diffraction modulation element and image display device

An image of an inspection target having a concave and convex pattern is picked up in an off-focus state by an image pickup element Further, the image of the inspection target picked up in the off-focus state is taken in by an image processing computer Based on the image, the image processing computer prepares a light intensity profile having a peak corresponding to a boundary portion between a concave portion and a convex portion of the concave and convex pattern of the inspection target. For example, a change of the width of the concave or convex portion of the concave and convex portion can be detected very accurately, by measuring the width of the concave or convex portion of the concave and convex portion on the basis of the intensity profile.

Inspection apparatus and method

The imaging magnification of an imaging optical system is set such that the image resolution of an ultraviolet CCD camera is within a range from 10 nm to 30 nm, on a resist pattern to be inspected. In addition, every time when the ultraviolet CCD camera picks up an image, the resist pattern to be inspected is irradiated at an irradiation light amount within a range from 0.5 mJ/cm to an irradiation threshold value at which the resist pattern is not caused to contract or an irradiation threshold value at which an absorption rate of an anti-reflection film provided near the resist pattern is not caused to change.

An optical device having a periodic inverted domain construction is used for second harmonic generating devices or the like. The optical device comprises a ferroelectric crystal substrate which is provided in this surface with a periodic inverted domain structure consisting of a plurality of parallel inverted domain regions arranged at intervals. The thickness t and width w of the inverted domain regions and the thickness T of the ferroelectric crystal substrate meet the criteria expressed by: t/w.gtoreq.1 and 0.1&lt;t/T.ltoreq.1.

Growing community of inventors

Tokyo, Japan

Ayumu Taguchi