Ebara Corporation

Ayumu Saito

Asagi Matsugu

Kenichi Kobayashi

Takashi Mitsuya

Akihiro Yazawa

Yasuyuki Miyasawa

Hideharu Aoyama

Manato Furusawa

Tsuyoshi Soma

Yusuke Sasaya

Keiichi Nojo

To achieve a cleaning module and a substrate processing apparatus that can improve the cleaning capability for a substrate with a simple structure. A cleaning module includes a first transfer mechanism-, an ultrasonic cleaning tank, a transfer machine, and a second transfer mechanism-. The first transfer mechanism-is for transferring a substrate WF with a surface to be polished facing downward up to a substrate grip or release positionon a downstream side along a transfer passage. The ultrasonic cleaning tankis disposed at a position spaced apart from the transfer passageand is for cleaning a substrate WF with the surface to be polished facing downward. The transfer machineis for transferring the substrate WF between the substrate grip or release positionof the transfer passageand the ultrasonic cleaning tank. The second transfer mechanism-is for transferring the substrate WF transferred to the substrate grip or release positionfrom the ultrasonic cleaning tankby the transfer machineto further downstream along the transfer passage

Transfer apparatus, cleaning module, and substrate processing apparatus

Accuracy of detection of a fly out of a substrate from a polishing head is improved. A substrate processing apparatus includes a polishing tableto which a polishing padfor polishing the substrate is attachable, a polishing headfor holding and pressing the substrate against the polishing pad, a retainer member disposed surrounding the polishing head, a retainer member pressurization chamber disposed adjacent to the retainer member, an armfor holding and turning the polishing head, and a slip out detectorfor detecting a fly out of the substrate from the polishing headbased on a turning torque of the armor based on a flow rate of a fluid supplied to the retainer member pressurization chamber.

Substrate processing apparatus, substrate processing method, and storage medium that stores program to cause computer in substrate processing apparatus to execute substrate processing method

Growing community of inventors

Tokyo, Japan

Ayumu Saito