Hitachi High-Tech Corporation

Olympus Corporation

Hitachi-High-Technologies Corporation

Ayumi Doi

Takuma Yamamoto

Tomohiro Funakoshi

Miki Isawa

Kazuhisa Hasumi

Tsunehiro Sakai

Tomohiro Tamori

Tianming Li

Koichiro Irie

Provided is a technology for evaluating a property of a pattern formed inside a sample from two-dimensional information of the sample. A pattern evaluation system of the present disclosure includes a computer subsystem that executes a process of evaluating a property of a pattern by reading a program from a memory that stores the program for evaluating the property of the pattern formed inside a sample. The computer subsystem executes a process of acquiring an image of the sample; a process of extracting a signal waveform from the image; a process of calculating a feature amount in a predetermined region of the signal waveform; a process of comparing the feature amount with a reference value of the feature amount; and a process of evaluating the property of the pattern based upon a comparison result in the comparison process.

Pattern evaluation system and pattern evaluation method

A pattern evaluation device has measurement or inspection conditions, supplied for the measurement and inspection of a replica produced by transferring a pattern for a semiconductor wafer or the like, which can be easily set, and with which recipes can be easily generated, when measurement and inspection conditions for the semiconductor wafer or the like and recipes in which these conditions are stored have been prepared in advance. The pattern evaluation device in which a pattern formed on the semiconductor wafer is evaluated on the basis of image data or signal waveforms obtained on the basis of beam irradiation or probe scanning of the semiconductor wafer, wherein the device conditions for evaluating the semiconductor wafer are converted to device conditions for evaluating a replica obtained by transferring a part of a pattern of the semiconductor wafer, and the converted device conditions are used to evaluate the replica.

Pattern evaluation device

A sample observation device of the invention includes: a charged particle optical column for irradiating a sample with charged particle beams at a first acceleration voltage, the sample having a target part to be observed which is a concave part; an image acquisition part for acquiring an image including the target part to be observed on the basis of signals obtained by irradiation with the charged particle beams; a memory part for memorizing in advance, at each of a plurality of acceleration voltages, information indicating a relationship between a brightness ratio of a concave part to a periphery part of the concave part in a standard sample and a value indicating a structure of the concave part in the standard sample; and an operation part for obtaining a brightness ratio of the concave part to a periphery part of the concave part in the image. The operation part judges appropriateness/inappropriateness of the first acceleration voltage with the use of the information indicating the relationship and the brightness ratio in the image.

Sample observation device having a selectable acceleration voltage

In a control circuit apparatus and an endoscope apparatus circuit disposition in which the outer edge of the first overheating region and the outer edge of the second overheating region approach the outer edge of the first overheating region and the outer edge of the second overheating region to an extreme in a state in which the outer edge of the first overheating region and the outer edge of the second overheating region do not overlap the outer edge of the first overheating region and the outer edge of the second overheating region serves as circuit disposition having a minimum mounting area on a substrate.

Control circuit apparatus and endoscope apparatus

Growing community of inventors

Tokyo, Japan

Ayumi Doi