Applied Materials, Inc.

Ayad A Al-Shaikh

Randhir P S Thakur

Ming Xi

Avgerinos V Gelatos

Alfred W Mak

Salvador P Umotoy

Walter Benjamin Glenn

Ahmad A Khan

Jianming Fu

Praburam Gopalraja

Bradley Owen Stimson

Michael Rosenstein

An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.

Apparatus for cyclical depositing of thin films

Apparatus for cyclical deposition of thin films

Apparatus providing a low impedance RF return current path between a shield member and a pedestal in a semiconductor wafer processing chamber. The return path reduces RF voltage drop between the shield member and the pedestal during processing. The return path comprises a conductive strap connected to the pedestal and a conductive bar attached to the strap. A toroidal spring makes multiple parallel electrical connections between the conductive bar and the shield member. A support assembly, attached to a collar on the chamber wall, supports the conductive bar.

Apparatus for providing RF return current path control in a semiconductor wafer processing system

Growing community of inventors

Santa Clara, CA, United States of America

Ayad A Al-Shaikh