Applied Materials, Inc.

Axel Wenzel

Matthias Brunner

Ralf Schmid

Bernhard Gunter Mueller

Nikolai Knaub

Georg Jost

A method for testing a packaging substrate with at least one electron beam column is described, wherein the packaging substrate is a panel level packaging substrate or an advanced packaging substrate. The method includes placing the packaging substrate on a stage in a vacuum chamber; directing at least one electron beam of the at least one electron beam column on at least a first portion of the packaging substrate; directing the at least one electron beam of the at least one electron beam column on at least a second portion of the packaging substrate; detecting signal electrons emitted upon impingement of the at least one electron beam for testing a first device-to-device electrical interconnect path of the packaging substrate; and illuminating at least a third portion of the packaging substrate with UV radiation.

Method for testing a packaging substrate, and apparatus for testing a packaging substrate

The invention relates to a method of calibration of the beam position of a corpuscular beam. A calibration body with structures is used, wherein the structures have a structure period Pin the plain section and within each structure there is a position L intended for the measurement. For the calibration, at least one detection signal each at structures in the plain section of the calibration body is generated, wherein the corpuscular beam is deflected with deflectors on beam target positions Lwith the beam target period P, which is larger than half of the structure period P, whereby a basic calibration is used for the control of the deflectors, and wherein the beam target deflections deviate either in the beam target period Pfrom the structure period Pand/or in the beam target position Lfrom the position L.

Method for beam calibration and usage of a calibration body

The present invention provides a method of electron beam testing of liquid crystal displays comprising non-uniform electrodes having a conductive portion and a dielectric portion. In accordance with methods of the present invention, the diameter of the electron beam is increased so that the beam is less focused, i.e., enlarged or 'blurred,' over a non-uniform electrode area. The diameter of the beam is increased so that the beam generates secondary electrons from the conductive portion of the non-uniform electrode area. The configured test beam may be circular, elliptical, or other suitable shapes.

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Augsburg, Germany

Axel Wenzel