Hoechst Aktiengesellschaft

Axel Schmitt

Wolfgang Zahn

Gerhard Buhr

Siegfried Scheler

Hans-Joachim Merrem

Fritz Erdmann

Burkhard Behrens

A radiation-sensitive composition is disclosed comprising a polymeric binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solution and a 2,3,4,4'-tetrahydroxybenzophenone which is partially esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid, which additionally contains either a dihydroxybenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid or a trihydroxybenzophenone which is partially or completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid. The weight ratio of esterified 2,3,4,4'-tetrahydroxybenzophenone to esterified di- or trihydroxybenzophenone varies between about 4:6 and 7:3 and the esterified hydroxybenzophenones, as a whole, are present in a proportion of 5 to 40% by weight, based on the total weight of solids contained in the composition. Also disclosed is a radiation-sensitive recording material comprising a support and a layer containing this composition, which is present on the support.

Radiation-sensitive composition containing esterification product of

The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.

Composition containing naphthoquinone diazide sulfonic acid mixed esters

The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.

Radiation-sensitive ester and process for its preparation

A positive-working photosensitive mixture is disclosed, which comprises an o-quinonediazide as the photosensitive compound and a novolak resin, which is insoluble in water and soluble in aqueous-alkaline media, as a binder, said novolak resin being prepared by condensation of a mixture comprising m-cresol and 2,3,6-trialkylphenol with a carbonyl component, preferably in a solvent. The photosensitive mixture containing the above-described binder is distinguished by high thermal stability and by a low dark erosion rate when developed with a metal ion-free developer.

Positive-working photosensitive mixture and recording material of high

The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of

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Walluf, Germany

Axel Schmitt