Schott Ag

Bam Bundesanstalt Fuer Materialforschung Und-pruefung

Bam Bundesanstalt Fur Materialforschung Und-prufung

Axel Engel

Joseph S Hayden

Katrin Hoffmann

Ute Resch-Genger

Ulrich Peuchert

Uwe Kolberg

Martin Letz

Thilo Zachau

Lutz Parthier

Thomas Kloss

Gerhard Lautenschläger

Ralf Jedamzik

Ute Natura

Ewald Moersen

Clemens Kunisch

Andreas Voitsch

Karine Seneschal

Matthias Schmidt

Michael Stelzl

Rainer Haspel

Gerhard Westenberger

Roland Nitschke

Doris Ehrt

Peter Fischer

Carol Click

Dietmar Keutel

Christian Lemke

Guenter Grabosch

Andreas Krieg

Christian Pitzel

A flat glass is provided that exhibits high transmittance to electromagnetic radiation in a range of wavelengths from 200 nm to 1500 nm. The transmittance for the flat glass having a thickness of 1 mm is 20% or more at a wavelength of 254 nm, 82% or more at a wavelength of 300 nm, 90% or more at a wavelength of 350 nm, 92% or more at a wavelength of 546 nm, 92.5% or more at a wavelength of 1400 nm, 91.5% or more in a wavelength range from 380 nm to 780 nm, and 92.5% or more in a wavelength range from 780 nm to 1500 nm.

Flat glass, method for producing same, and use thereof

A method is provided for determining the thermal expansion of a low thermal expansion material with very high accuracy of at most +/&#x2212;3 ppb/K or less and/or with a reproducibility of at most +/&#x2212;1 ppb/K or less. A measuring device is also provided that includes an advanced push rod dilatometer.

High-precision method for determining thermal expansion

The invention describes a glass and a glass-ceramic which at least includes the constituents SiO, AlOand YOand is preferably doped with rare earth ions. The weight ratio between the weight of YOand the total weight of SiO, AlOand YOis at least 0.2, preferably at least 0.4 or more. The rare earth ions can preferably be incorporated in crystal phases which are precipitated out of glass with a high yttrium content.

Conversion material

The method determines laser stability of an optical material, which is suitable for making an optical element through which high-energy light passes. The method includes pre-irradiation to produce radiation damage and measurement of the resulting induced non-intrinsic fluorescence. The method is distinguished by excitation of induced fluorescence immediately after pre-irradiation and after at least ten minutes after pre-irradiation with light of a wavelength between 350 and 810 nm, and measurement and quantitative evaluation of fluorescence intensities at wavelengths between 550 nm and 810 nm. Especially laser-stable optical materials, particularly CaFcrystals, have a normalized difference (Z) of the fluorescence intensities measured at a first time immediately after pre-irradiation and at a second time at least ten minutes after the pre-irradiation, as calculated by the following equation (1):=()&#x2003;&#x2003;(1),which is less than 0.3.

Method of determining laser stabilities of optical materials, crystals selected according to said method, and uses of said selected crystals

The invention relates to a multi-functional calibration system () for characterizing luminescence measurement systems, in particular spectrally resolving, wide-field and/or confocal imaging systems, with

Multi-functional calibration system and kit, and their uses for characterizing luminescence measurement systems

The invention discloses a standard for referencing luminescence signals, having an optically transparent base material comprising a lanthanum phosphate glass, a fluorophosphate glass, a fluor-crown glass, a lanthanum glass, a glass-ceramic formed therefrom or a lithium aluminosilicate glass-ceramic, the base material including a bulk doping with at least one constituent which is luminescent and comprises at least one rare earth and/or a nonferrous metal, in particular cobalt, chromium or manganese.

Standard for referencing luminescence signals

The method for determining local structures in optical materials, especially crystals, includes observing schlieren visually in a material to be tested with divergent white light in a first step; measuring birefringence of polarized laser light in the material to determine local defects and structure faults in the material with a spatial resolution of 0.5 mm or better in a second step if the material is judged to be suitable in the first step and then interferometrically measuring the material to determine the faults in the material by interferometry in a third step if the material is judged to be suitable in the first and second steps. This method can be part of a method for making optical components, especially for microlithography.

Method of determining local structures in optical crystals

Growing community of inventors

Ingelheim, Germany

Axel Engel