Lucent Technologies Inc.

Alcatel Lucent

At&t Bell Laboratories

Agere Systems Inc.

Alcatel-Lucent USA Inc.

American Telephone & Telegraph Co., At&t Bell Laboratories

Agere Systems Guardian Corp.

American Telephone and Telegraph, Co.

Avinoam Kornblit

Joseph Ashley Taylor

Taeho Kook

Sailesh Chittipeddi

Thomas Nikita Krupenkin

Nagesh R Basavanhally

Shu Yang

Mary Louise Mandich

Tobias Manuel Schneider

Stanley K Pau

Vladimir Anatolyevich Aksyuk

Alan Michael Lyons

Paul Robert Kolodner

Timofei Nikita Kroupenkine

Brijesh Vyas

Anthony E Novembre

Todd Richard Salamon

Donald Weiss

Tseng-Chung Lee

Robert Francis Fullowan

Warren Yiu-Cho Lai

David John Bishop

Heon Lee

Kurt George Steiner

William T Lynch

Maria Elina Simon

Marc Scott Hodes

George Knoedl, Jr

James Alexander Liddle

John VanAtta Gates

Vincent Michael Donnelly, Jr

Chong-Cheng Fu

Steven Alan Lytle

Edward Alois Rietman

Helen Louise Maynard

Wonsuck Lee

Gen M Chin

Tzu-Yin Chiu

Alexander M Voshchenkov

Joseph Lebowitz

Kwing F Lee

Marc Hodes

Kolawole R Olasupo

Maureen Y Lau

Tungsheng Yang

Mark D Morris

Ronald C Hanson

Nacer Layadi

Wan Yee Cheung

Kalman Pelhos

A method and apparatus is disclosed wherein the movement of a droplet disposed on a nanostructured or microstructured surface is determined by at least one characteristic of the nanostructure feature pattern or at least one characteristic of the droplet. In one embodiment, the movement of the droplet is laterally determined by at least one characteristic of the nanostructure feature pattern such that the droplet moves in a desired direction along a nanostructured feature pattern. In another embodiment, the movement of the droplet is determined by either at least one characteristic of the nanostructure feature pattern or at least one characteristic of the droplet in a way such that the droplet penetrates the feature pattern at a desired area and becomes substantially immobile.

Apparatus for controlling the movement of a liquid on a nanostructured or microstructure surface

Apparatus including a chip substrate having a first chip surface facing away from a second chip surface; an array of microelectronic elements on the first chip surface; and an array of conductors each in communication with one of the microelectronic elements, the conductors passing through the chip substrate and fully spanning a distance between the first and second chip surfaces. Process including: providing an apparatus including a chip substrate having a first chip surface facing away from a second chip surface, an array of microelectronic elements being on the first chip surface, an array of conductors each being in communication with one of the microelectronic elements and partially spanning an average distance between the first and second chip surfaces; bonding a temporary support carrier onto the array of microelectronic elements; removing a portion of the chip substrate, thereby reducing the average distance between the first and second chip surfaces; and forming an under bump metallization pad at the second chip surface in electrical communication with a conductor.

Process for making microelectronic element chips

A method of forming low stack height transistors having controllable linewidth in an integrated circuit without channeling is disclosed. A disposable hardmask of doped glass is utilized to define the gate and subsequently protect the gate (and the underlying substrate) during ion implantation which forms the source and drains. A variety of silicided and non-silicided) structures may be formed.

Transistor fabrication method

Device including channel having channel input and output. Channel has interior channel surface extending along channel path from channel input to output. In one implementation, channel includes plurality of channel sections in serial communication along channel path. Each of channel sections includes first internal circumference spaced apart along channel path from second internal circumference, in each of channel sections the first and second internal circumferences being substantially different. Each of channel sections includes sub-surface of interior channel surface. At least region of sub-surface of each channel section includes distribution of raised micro-scale features. As another implementation, at least first region of interior channel surface includes distribution of raised micro-scale features interrupted by plurality of raised barriers spaced apart along channel path on interior channel surface. Each raised barrier extends on interior channel surface in directions partially transverse to and partially parallel to longitudinal axis. Method also provided.

Directed-flow conduit

Device having first wick evaporator including first membrane and plurality of first thermally-conductive supports. First membrane has upper and lower surfaces. First membrane also has plurality of pores with upper pore ends at upper surface of first membrane and with lower pore ends at lower surface of first membrane. Each of first thermally-conductive supports has upper and lower support ends. Upper support ends of first thermally-conductive supports are in contact with first membrane. Each of first thermally-conductive supports has longitudinal axis extending between the upper and lower support ends, average cross-sectional area along axis, and membrane support cross-sectional area at upper support end, the membrane support cross-sectional area effectively being smaller than average cross-sectional area. First thermally-conductive supports are configured to conduct thermal energy from lower support ends of first thermally-conductive supports to first membrane. Process includes providing wick evaporator, providing liquid working fluid in contact with lower or upper surface of membrane, and causing liquid working fluid to be evaporated from liquid-vapor interface in membrane.

Thermal energy transfer device

Microelectronic element chips

A method and apparatus is disclosed wherein nanostructures or microstructures are disposed on a surface of a body (such as a submersible vehicle) that is adapted to move through a fluid, such as water. The nanostructures or microstructures are disposed on the surface in a way such that the contact between the surface and the fluid is reduced and, correspondingly, the friction between the surface and the fluid is reduced. In an illustrative embodiment, the surface is a surface on a submarine or other submersible vehicle (such as a torpedo). Illustratively, electrowetting principles are used to cause the fluid to at least partially penetrate the nanostructures or microstructures on the surface of the body in order to selectively create greater friction in a desired location of the surface. Such penetration may be used, for example, to create drag that alters the direction or speed of travel of the body.

Method and apparatus for controlling friction between a fluid and a body

Apparatus and method for increasing the concentration of a chemical substance in a fluid comprise a micro-fluidic elongated channel formed in a substrate, with the channel being in fluid-flow communication with an ambient region along its elongated dimension. In general, the fluid includes first and second chemical substances having different vapor pressures. The apparatus includes an evaporation controller for increasing the evaporation rate of the fluid from the channel into the ambient region, thereby increasing the concentration of the higher vapor pressure (HVP) substance in the portion of the fluid remaining in the channel and increasing the concentration of the lower vapor pressure (LVP) substance in the portion of the fluid evaporated into the ambient region.

Micro-channel chemical concentrator

An adjustable compound optical microlens apparatus comprises first and second microlenses that are separated from one another along their optical axes. At least one of the microlenses is movable relative to the other. In a preferred embodiment, one microlens is stationary, the other movable. A MEMS controller electrically controls the position of the movable microlens relative to the stationary microlens, or the positions of at least two movable microlenses relative to one another. In accordance with one embodiment of our invention, an array of such microlens apparatuses is also contemplated, especially for applications such optical switches and routers. In accordance with another embodiment of our invention, the apparatus functions as an optical filter or dispersion compensator. Also described is method of compensating for variations in an optical parameter (e.g., effective focal length) of such an apparatus in an array.

Adjustable compound microlens apparatus with MEMS controller

The present invention provides a method of manufacturing a semiconductor device. The method includes depositing a metal oxide containing a dopant and having a high dielectric constant on a substrate; wherein the metal is aluminum or silicon and the dopant is zirconium or hafnium and etching the doped metal oxide with a plasma containing a halogenated compound.

Device having a high dielectric constant material and a method of manufacture thereof

The specification describes an interferometric in-situ end point detection technique for plasma etching in which the end point is predicted before any overetching occurs. It is based on the recognition that the wavelength of the monitoring beam can be selected so that only a single interferometric fringe appears before clearing. Knowing there is only one fringe, detection is simplified and the etching process can be terminated while a finite but small thickness of the layer remains. This allows etching partial thicknesses of layers. It also allows a two step etch process wherein the etch chemistry can be changed to a highly selective etch to complete clearing of the layer.

Etch endpoint detection

The invention provides an improved process for fabricating masks suitable for use in SCALPEL and similar electron-based or ion-based lithographic processes. Specifically, the process allows use of commercially-available (100) oriented silicon substrates, and better control over the profiles of mask struts. Specifically, the struts of the mask are formed by plasma etching, using a fluorine-based gas, and a unique multilayer mask blank is fabricated to promote successful use of the plasma etch. According to an embodiment of the process, an etch stop layer is deposited onto the front surface of a silicon substrate, and a membrane layer is deposited over the etch stop layer. A scattering layer, typically tungsten, is deposited over the membrane layer. A patterning layer is deposited on the back surface of the substrate, and the desired grillage pattern for the struts is patterned into the patterning layer. The grillage structure is then etched into the silicon, to form the struts, by plasma etching with the fluorine-based gas. The etch stop layer acts to prevent the etch from damaging the membrane layer.

Process for fabricating a lithographic mask

A data visualization method and apparatus permit the representation of multi-dimensional input data sequences as output sequences of closed form visual representations known as blobs. By noting changes in the shape of blobs as processing of the input sequence progresses, changes in characteristics of entities represented by the input sequence can be readily ascertained by observation. In an illustrative embodiment, a plasma etching process used in semiconductor fabrication can be observed and controlled by monitoring changes in blobs corresponding to the etching process variables.

Dynamic data visualization

Growing community of inventors

Highland Park, NJ, United States of America

Avinoam Kornblit