Sage Electrochromics, Inc.

Saint-gobain Abrasives, Inc.

Saint-gobain Abrasifs

Avanti M Jain

Jean-Christophe Giron

Arup K Khaund

Yinggang Tian

Neil L Sbar

Paul W Rehrig

Erik Jon Bjornard

Susanne Liebelt

Wei Che

Zachary Richard Patterson

Vincent Tesi

Vincent Tési

An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.

Moisture resistant electrochromic device

An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.

Abrasive article and method of forming

A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.

Multiple barrier layer encapsulation stack

Growing community of inventors

Richland, WA, United States of America

Avanti M Jain