Applied Materials, Inc.

Atul Bhaskar Chaudhari

Jennifer Y Sun

Prerna Sonthalia Goradia

Xiaowei Wu

Geetika Bajaj

Ankur Kadam

Sivapackia Ganapathiappan

Srobona Sen

Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous seed layer and a transition metal-containing layer. The halogen resistant coating uniformly covers features of the chamber component, such as those having an aspect ratio of about 3:1 to about 300:1.

Halogen resistant coatings and methods of making and using thereof

A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.

Additive manufacturing of polishing pads

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Mumbai, India

Atul Bhaskar Chaudhari