Basf Se Corporation

Synkola, S.r.o.

Attila Latika

Pascal Hayoz

Jean-Pierre Wolf

Jean-Luc Birbaum

Stephan Ilg

Stefan Rndr Prof Toma

Jiang Weng

Juraj Ing Rehak

Martin Rndr Hutka

Gui Prof Lu

Henrich Brath

Yong-Bo Li

Julius Ing Durmis

Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C-Calkyl; C-Calkyl interrupted by one or more O; is -L-X&#x2014;Ror -L-R; Rhas for example one of the meanings as given for R; Ris a monovalent sensitizer or photoinitiator moiety; Arand Arfor example independently of one another are phenyl substituted by C-Calkyl, halogen or OR; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C-Calkyl, OH or OR; or are &#x2014;Ar-A-Ar; Aris unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C-Calkyl, ORor benzoyl; Aris phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C-Calkylene; X is CO, C(O)O, OC(O), O, S or NR; L is C-Calkylene or C-Calkylene interrupted by one or more O; Ris C-Calkyl or C-Chydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators. 

Sulphonium salt initiators

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Bratislava, Slovakia

Attila Latika