Shin-etsu Chemical Co., Ltd.

Shin-etsu Chemical C O., Ltd.

Atsushi Watabe

Masaki Takeuchi

Yukio Shibano

Shuhei Ueda

Daijitsu Harada

Yoko Ishitsuka

Masaki Tabata

Daisuke Kusabiraki

Satoru Miharada

Harunobu Matsui

Tetsushi Tsukamoto

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 &#x3bc;m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method

The invention provides a method for producing a synthetic quartz glass substrate, the method includes arranging spacers to be in contact with outer peripheral side surfaces of a synthetic quartz glass substrate, arranging plate materials to be in contact with the outer peripheral side surfaces of the spacers in a state that the plates are protruded from the surface of the substrate, and sandblasting the surface of the substrate.

Method for producing synthetic quartz glass substrate

Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.

Method for preparing synthetic quartz glass substrate

There is furnished a working tool comprising a rotating shaft (), a polishing plate () mounted on the shaft, an expandable elastomer sheet () attached to the polishing plate (), an abrasive cloth () attached to the elastomer sheet (), and means for pressing the elastomer sheet () at a plurality of positions under respective predetermined different pressures such that a lower surface of the abrasive cloth () is deformed to the desired inverted convex shape in accordance with differences of pressing force applied to the elastomer sheet () at the plurality of positions. A substrate is produced by bringing the inverted convexly deformed surface of the abrasive cloth () in contact with a substrate stock, and rotating and moving the working tool for polishing the substrate over a selected area.

Method for producing substrate

A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.

Method of preparing substrate

Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

Polishing agent for synthetic quartz glass substrate

A large-size synthetic quartz glass substrate is produced by measuring a flatness and parallelism of front and back surfaces of a synthetic quartz glass substrate stock having a diagonal length of at least 1,000 mm, and partially removing raised portions and thick portions of the substrate stock on the basis of the measured data of flatness and parallelism. The removing step includes abrasive working by a first working tool having a diameter of 15-50% of the diagonal length, and abrasive working by a second working tool having a smaller diameter.

Method for producing large-size synthetic quartz glass substrate

A large-sized substrate having a diagonal length of not less than 500 mm and a ratio of flatness/diagonal length of not more than 6&#xd7;10is disclosed. By use of the large-sized substrate for exposure of the present invention, the exposure accuracy, particularly the register accuracy and resolution are enhanced, so that it is possible to achieve high-precision exposure of a large-sized panel. With the processing method according to the present invention, it is possible to stably obtain a large-sized photomask substrate with a high flatness, and since the CD accuracy (dimensional accuracy) at the time of exposure of the panel is enhanced, it is possible to perform exposure of a fine pattern, leading to a higher yield of the panel. Furthermore, by applying the processing method according to the present invention, it is also possible to create an arbitrary surface shape.

Large-sized glass substrate

A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from (2) a deflection of the substrate stock by its own weight in the horizontal attitude, (3) a deformation of the photomask substrate caused by chucking in an exposure apparatus, and (4) an accuracy distortion of a platen for supporting a mother glass.

Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method

A large-sized substrate having a diagonal length of not less than 500 mm and a ratio of flatness/diagonal length of not more than 6.0&#xd7;10is disclosed. By use of the large-sized substrate for exposure of the present invention, the exposure accuracy, particularly the register accuracy and resolution are enhanced, so that it is possible to achieve high-precision exposure of a large-sized panel. With the processing method according to the present invention, it is possible to stably obtain a large-sized photomask substrate with a high flatness, and since the CD accuracy (dimensional accuracy) at the time of exposure of the panel is enhanced, it is possible to perform exposure of a fine pattern, leading to a higher yield of the panel. Furthermore, by applying the processing method according to the present invention, it is also possible to create an arbitrary surface shape.

Large-sized substrate and method of producing the same

A large-size substrate having improved flatness is prepared by measuring the flatness of one surface or opposite surfaces of a large-size substrate having a diagonal length of at least 500 mm, and partially removing raised portions on the one surface or opposite surfaces of the substrate by means of a processing tool on the basis of the measured data. The processing tool is adapted to blast a slurry of microparticulates in water carried on compressed air against the substrate.

Method for preparing large-size substrate

A silica glass substrate is obtained by polishing, cleaning, drying and etching a silica glass substrate slice. When the substrate on one surface is treated with a reactive reagent, defects having a size of at least 0.3 &#x3bc;m in a direction parallel to the substrate major surface are absent on the substrate surface. The silica glass substrate, in which no submicron defects manifest on the substrate surface even when treated as by cleaning or etching, serves as a reticle for use in photolithographic IC fabrication, achieving an improved manufacturing yield in the semiconductor device fabrication and microelectronic system fields.

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Joetsu, Japan

Atsushi Watabe