Matsushita Electric Industrial Co., Ltd.

Matsushita Electrical Industrial Co., Ltd.

Atsushi Ueno

Noboru Nomura

Kazuhiko Hashimoto

Takeo Sato

Satoshi Kinoshita

Koichi Kawata

Nobuhiro Araki

Shotaro Yoshida

An optically oriented photoresist material comprised of an organic polymer and an organic crystal material each having a different refractive index to form an optically oriented layer on a substrate wherein the optical waveguide is formed by an effect of the refractive index difference, and in said waveguide layer thus formed, the spread and scattering of lights are suppressed and very fine mask patterns of said photoresist can be produced.

Optically oriented photoresist pattern forming method using organic

A projection optical system for photolithography includes a refraction sub-system and a cata-dioptric sub-system optically connected to each other. The refraction sub-system extends at an object side. The cata-dioptric sub-system extends at an image side. The refraction sub-system is generally composed of refracting members. The cata-dioptric sub-system is generally composed of a phase compensating member, a concave mirror, and a convex mirror. The phase compensating member adjoins the refraction sub-system. At least the concave mirror has a central opening through which light passes. The light forms an image at a rear of the concave mirror.

Projection optical system

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Hirakata, Japan

Atsushi Ueno