Hitachi High-tech Science Corporation

Sii Nanotechnology Inc.

Seiko Instruments Inc

Atsushi Uemoto

Tatsuya Asahata

Xin Man

Yo Yamamoto

Makoto Sato

Hidekazu Suzuki

Ayana Muraki

Satoshi Tomimatsu

Kazutoshi Watanabe

Masahiro Kiyohara

Osamu Takaoka

Shota Torikawa

Haruyuki Ishii

Masato Suzuki

Kaoru Umemura

Masatoshi Yasutake

Toshiaki Fujii

Naoya Watanabe

Junichi Tashiro

Toshihiro Mochizuki

Yoshiteru Shikakura

Mitsuyoshi Sato

Masakatsu Hasuda

Toshio Doi

Seiji Morita

Takuma Aso

Takuya Nakaue

Kengo Takeno

An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

Automatic sample preparation apparatus

Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.

Charged particle beam apparatus and control method thereof

The focused ion beam apparatus includes: an electron beam column; a focused ion beam column; a sample stage; a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on a sample, plane coordinates of each of the irradiation positions; a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a eucentric height so that the eucentric height matches an intersection position at which the electron beam and the focused ion beam match each other at each of the irradiation positions; and a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height at each of the irradiation positions.

Focused ion beam apparatus

Provided is a charged particle beam apparatus including a focused ion beam column, a sample holder, a stage supporting the sample holder, a securing member rotating unit, a stage driving unit, and a control device. The sample holder includes a securing member fixing a sample. The securing member rotating unit rotates the securing member around a first rotational axis and a second rotational axis. The stage driving unit translates the stage in three dimensions and rotates the stage around a third rotational axis. The control device acquires a correction value for correcting a change in a position of a center of rotation for rotation around at least one among a first rotational axis, a second rotational axis, and a third rotational axis. The control device translates the stage according to the correction value.

Charged particle beam apparatus

To accomplish fast automated micro-sampling, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform position control with respect to a second target, based on a machine learning model in which first information including a first image of a first target is learned, and on second information including a second image, which is obtained by irradiation with the charged particle beam.

To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.

A focused ion beam apparatus () includes: a focused ion beam lens column (); a sample table (); a sample stage (); a memory (M) configured to store in advance three-dimensional data on the sample table and an irradiation axis of the focused ion beam, the three-dimensional data being associated with stage coordinates of the sample stage; a display (); and a display controller (A) configured to cause the display to display a virtual positional relationship between the sample table () and the irradiation axis (Av) of the focused ion beam, which is exhibited when the sample stage is operated to move the sample table to a predetermined position, based on the three-dimensional data on the sample table and the irradiation axis of the focused ion beam.

An automatic sample preparation apparatus that automatically prepares a sample piece from a sample includes: a focused ion beam irradiation optical system configured to irradiate a focused ion beam; an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam; a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample; a detector configured to detect secondary charged particles emitted from an irradiation object by irradiating the irradiation object with the focused ion beam and/or the electron beam; and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the transfer device.

Automatic sample preparation apparatus and automatic sample preparation method

According to one embodiment, an automatic sample preparation apparatus includes: a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam; a sample stage configured to move with the sample placed thereon; a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample; a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred; a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to transfer and stop the sample piece held by the sample piece transfer device with a gap between the sample piece holder and the sample piece, and connect the sample piece to the sample piece holder.

A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

A portable information terminal is separated from a charged particle beam irradiation apparatus for performing processing of a sample by irradiating the sample with a charged particle beam. The portable information terminal performs operation of a first operation item at a desired position and includes a display controller causing a display unit to display an image containing a graphical user interface (GUI) capable of operating the first operation item based on operation by a user, the first operation item being one or more operation items among a plurality of items operable in the charged particle beam irradiation apparatus.

Portable information terminal, beam irradiation system, and program

A method for cross-section processing and observation, and apparatus therefor, includes performing a position information obtaining process of observing the entirety of a sample by using an optical microscope or an electron microscope, and obtaining three-dimensional position coordinate information of a particular observation target object included in the sample; performing a cross-section processing process of irradiating a particular region in which the object is present by using a focused ion beam based on the information, and exposing a cross section of the region; performing a cross-section image obtaining process of irradiating the cross section by using an electron beam, and obtaining a cross-section image of a predetermined size region including the object; and performing a three-dimensional image obtaining process of repeating the cross-section processing process and the cross-section image obtaining process at predetermined intervals in a predetermined direction, and obtaining a three-dimensional image from the multiple cross-section images.

Method for cross-section processing and observation and apparatus therefor

A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

A sample positioning method that can easily and quickly position a target observation area of a sample, which is disposed on a sample stage in a sample chamber of a charged particle beam apparatus, into a field of view of a first charged particle beam. The method includes displaying an image including the sample on a display screen; designating an attention point on the basis of the image on the display screen while maintaining the relative position of the attention point with respect to the sample stage; aligning the position of the sample stage in the direction of an optical axis so that the attention point is positioned in an on-axis point tracer plane perpendicular to the optical axis through an on-axis target point on the optical axis; moving the attention point to the on-axis target point by performing detection of deviation of the attention point from the on-axis target point and movement in the on-axis point tracer plane; and moving the attention point into a depth of focus of a charged particle beam optics.

Growing community of inventors

Tokyo, Japan

Atsushi Uemoto