Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Electric Corporation

Kyoto University

Mitsubishi Denki K.k.

Mitsubiski Denki Kaubshiki Kaisha

Atsushi Sugitatsu

Hajime Nakatani

Susumu Noda

Tatsuo Hatta

Yasushi Minamitani

Hiroshi Aruga

Keita Mochizuki

Hitoshi Tada

Hitoshi Wakata

Toshinori Yagi

Tadao Minagawa

Takeshi Saito

Norio Okada

Jun Fujita

Nobuyuki Zumoto

Aritomo Uemura

Nobuo Ohata

Masao Izumo

Yoshifumi Matsushita

Keiko Ito

Satoshi Tamura

Kazuyuki Murakami

An optical module includes a light emitting element, an optical fiber, a wavelength separating filter that is arranged at a predetermined angle with respect to a longitudinal direction of the optical fiber on a plane including the longitudinal direction of the optical fiber, and a lens for focusing light emitted from the light emitting element on the optical fiber via the wavelength separating filter. The light emitting element is arranged while being offset in a direction perpendicular to a central axis of the lens on a plane where the wavelength separating filter has the predetermined angle with respect to the central axis of the lens.

Optical module

An optical module includes a casing, a first light output unit that is fixed to the casing and generates a first light signal, a second light output unit that is fixed to the casing while an angle thereof is set to be different from that of the first light output unit and generates a second light signal having a wavelength different from that of the first light signal, a first branching filter that refracts at least any one of the first light signal and the second light signal so that optical axes of the first light signal and the second light signal are partially overlapped, and one isolator that is located at a portion where optical axes of the first light signal and the second light signal are overlapped and performs isolation on the first light signal and the second light signal.

In a wavelength monitor that monitors a wavelength of laser light emitted from at least two semiconductor lasers formed in parallel on a semiconductor substrate, the wavelength monitor includes a collimating lens that collimates laser light from each of the semiconductor lasers, an etalon that is arranged so that laser light collimated by the collimating lens is capable of entering and has a periodicity, and a photodetector that receives laser light transmitted through the etalon and detects a light intensity, wherein a beam propagation angle in the etalon of laser light emitted from each of the semiconductor lasers becomes a predetermined angle obtained by formula 1.

Wavelength monitor

Included are a first modulator, a second modulator, a first optical amplifier that amplifies an output of the first modulator at an amplification factor based on a first bias signal, a second optical amplifier that amplifies an output of the second modulator at an amplification factor based on a second bias signal, an optical phase adjuster that phase-rotates an output of the second optical amplifier, an optical multiplexer that multiplexes an output of the first optical amplifier with an output of the optical phase adjuster, and a second bias corrector that generates a first pulse signal and a second pulse signal, which are complementary to each other, and obtains a first bias value and a second bias value based on a change of strength of an output signal of the optical multiplexer. The first and second pulse signals are superimposed on the first and second bias signals, respectively.

Optical modulator, optical transmission device, and bias adjusting method

A semiconductor optical modulation device includes a semiconductor optical modulator, wires, an output side line, an input side line and a resistor. The semiconductor optical modulator is an electroabsorption optical modulator. One of the wires is connected between an electrode of the semiconductor optical modulator and the input side line. The other of the wires is connected between the electrode of the semiconductor optical modulator and the output side line. The resistor is connected in series with the output side line. Impedance of the output side line and impedance of the resistor are different from each other.

Optical modulation device

In an optical device, a slab layer includes an active layer sandwiched between cladding layers. The slab layer has a periodic refractive index profile structure in a two-dimensional plane, as a two-dimensional slab photonic crystal structure, and a linear defect region serving as a waveguide in the periodic refractive index profile structure. Regions having different widths of the waveguides, as segments of the waveguide, are connected in series.

Optical device and semiconductor laser oscillator

A semiconductor device has a two-dimensional slab photonic crystal structure in which a substrate supports a sheet-like slab layer including, sequentially stacked, a lower cladding layer, an active layer, and an upper cladding layer. A periodic refractive index profile structure, in surfaces of the stacked layers, introduces a linear defect region that serves as a waveguide. A p-type region and an n-type region in the slab layer define a pn junction surface at a predetermined angle with respect to the surfaces of the stacked layers in the slab layer.

Method of manufacturing a semiconductor device including a slab layer with a periodic air hole structure and a linear defect region

In an optical device, a slab layer has an active layer sandwiched between two cladding layers. Periodic air holes are present in the slab layer. A linear defect region is present in a part of the air hole structures. As a result, laser oscillation is generated at the band end in a two-dimensional photonic crystal waveguide mode.

Optical active device

An optical delay circuit includes a plurality of defect waveguides arranged in parallel and including a line-shaped defect in a periodic refractive-index distribution structure of a photonic crystal. The defect waveguides include a multiplexing/demultiplexing portion in which the defect waveguides are arranged close to each other to multiplex and demultiplex light; and an optical delay portion extending from the multiplexing/demultiplexing portion, in which the defect waveguides are arranged with a predetermined distance therebetween so that light propagating in any of the defect waveguides does not interfere with light propagating in the other defect waveguides. Each of the waveguides has a different configuration.

Optical delay circuit, integrated optical device, and method of manufacturing integrated optical device

Semiconductor device

A laser diode module includes a laser diode device, an optical device like a single lens placed in front of the laser diode device for reflecting front radiation emitted from a front surface of the laser diode device, and a photodiode placed at the back of the laser diode device and displaced from an optical axis of an optical system which includes the laser diode device, for detecting radiation reflected from the optical device.

Laser diode module

An optical switch includes a polymer optical waveguide that is a plate material basically made of polymer and a drive element. The plate material has optical waveguides that extend linearly within the plate material and a cut provided such that it traverses the optical waveguides. The drive element selects a path of light by reducing and increasing a gap of the cut.

Optical switch and method of producing the same

A free-space optical switch includes a micro-electro-mechanical system (MEMS) mirror array for switching an optical transmission path having an input MEMS mirror array and an output MEMS mirror array confronting an input fiber port array and an output fiber port array, respectively. The input MEMS mirror array and the output MEMS mirror array are integral with each other and divided from each other by at least two intersecting lines.

Free-space optical switch

An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

Optical processing method and apparatus for carrying out the same

An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.

Growing community of inventors

Tokyo, Japan

Atsushi Sugitatsu