Tokyo Electron Limited

Atsushi Rikukawa

Masaru Nishino

Seiichi Kaise

Shinobu Onodera

Shigeki Amemiya

Hiroki Fujita

A method for purging a substrate container which accommodates in multiple stages a plurality of substrates to be processed by a substrate processing apparatus, the method includes: mounting the substrate container on a mounting unit; connecting a gas supply port provided in the substrate container and a gas supply line provided in a mounting unit; starting supply of a dry gas into the substrate container from a gas supply line before opening a cover of the substrate container; opening the cover of the substrate container while keeping the supply of the dry gas; closing the cover of the substrate container upon completion of processing of the substrates in the substrate container; and stopping the supply of the dry gas after closing the cover of the substrate container.

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Miyagi, Japan

Atsushi Rikukawa