Hitachi, Ltd.

Hitachi-high-technologies Corporation

Ekc Technology Inc.

Atsushi Otake

Kinya Kobayashi

Kiyomi Yoshinari

Akira Kuroda

Nobuyoshi Sakai

Jun Sugihara

Wai Mun Lee

Atsumu Hirabayashi

Yasushi Terui

Toshiyuki Yokosuka

Junnosuke Nakatsugawa

Junpei Kusukawa

Hiroshi Morita

Toyoharu Okumoto

Hironori Matsumoto

Hisashi Takeda

Takanori Matsumoto

Cass X Shang

Tomoco Suzuki

An aqueous cleaning composition and method for post-CMP cleaning of a semiconductor device which contains a copper interconnect wherein the cleaning composition contains (A) N,N,N'-trimethyl-N&#x2032;-(2-hydroxyethyl)ethylenediamine; and (B) at least one corrosion inhibitor selected from the group consisting essentially of uric acid, xanthine, theophyline, paraxanthine, theobromine, caffeine, guanine, hypoxanthine, adenine, and combinations thereof.

Cleaning composition and method for cleaning a semiconductor device substrate after chemical mechanical polishing

A totally enclosed motor which includes a rotor disposed inside a housing and a heat of the rotor is transferred to the housing, a stator disposed inside the housing and a heat of the stator is transferred to the housing, and an inner fin which is disposed in the rotor and agitates air inside the housing. The totally enclosed motor is cooled by a forced convection by an outer fan disposed outside the housing, or by a natural convention in the vicinity of an outer surface of the housing, and a shape of the rotor is different between one end side and the other end side of the rotor in an extending direction of a rotary shaft of the rotor.

Totally enclosed motor

A composition that includes 2-(2-aminoethylamino)-ethanol, at least one of a chelating agent and a corrosion inhibitor, and water. The composition is capable of removing organic, organometallic and metal oxide residues from semiconductor substrates. The invention also relates to a method of removing etching residue from a semiconductor substrate.

Semiconductor process residue removal composition and process

The invention relates to compositions and methods for cleaning integrated circuit substrates. The compositions are in the form of an aqueous solution and include a quaternary ammonium hydroxide compound and a chelating compound. The chelating compound includes either boric acid or at least one N-substituted aminocarboxylate selected from the group consisting of N-bis(2-hydroxyethyl)glycine(bicine), N-tris(hydroxymethyl)methyl glycine (tricine) and mixtures thereof, and can optionally include glycine, Iminodiacetic acid (IDA), Nitrilo trizacetic acid (NTA), Ethylenediammine Tetraacetic acid (EDTA), or mixtures thereof.

Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixture

The present invention can provide a mass spectrometric system judging whether a measurement target is a substance required by an operator within an actual measurement time, when a substance (particularly such as protein or sugar chains) is analyzed. In the mass spectrometric system using a tandem mass spectrometer, a particular substance obtained by separating a sample is ionized, and mass analysis of the ionized substance is performed to obtain a spectrum. This spectrum is compared with a particular spectrum stored in advance, to thereby determine whether both the spectra match with each other. When a match is determined, a particular ion is further ionized within a particular time for detailed analysis. The invention also provides a mass spectrometric method, a diagnosis system and an inspection system each using the mass spectrometric system, and a program for operating a computer to control those systems with desired functions.

Mass spectrometric method, mass spectrometric system, diagnosis system, inspection system, and mass spectrometric program

A second program which uses the function of a first program is corrected in accordance with correction of the first program. A program management method of changing the second program in accordance with change of the first program is provided. Interface definition information indicating an interface of the first program is monitored. When change of the interface definition information is detected, the change of the interface definition information is notified to the second program which uses the function provided by the first program. The notification is received to change the second program.

Method and system for managing programs for web service system

In a method of automatically changing a client program in a client/server system, when an access request is transmitted from a client program to a server program and an error occurs, the cause of the error is analyzed and when the error is caused by change of an interface of the server program, a change location of the interface of the server program is detected. A change portion and a changing scheme of the client program related to the change of the interface are decided to change the client program and the client program being currently operated is replaced by the changed client program.

Automatic program changing method for client program interface

A program managing method in a web service system for providing a web service for testing a message which has been changed in response to a change made in interface definition information comprises steps for judging as to whether or not an error occurs when an access request made by a message is transmitted, which is caused by the change of the interface definition information indicative of an interface of a destination of the access request; changing the message in correspondence with a content of the changed interface definition information in the case that the error occurs which is caused by the change of the interface definition information; and transmitting an access request made by the changed message in a test mode. It then becomes possible to correct and test the program in a dynamic manner for preventing recurrence of this error.

An apparatus for analyzing mass spectrometric data is described. The apparatus has a first input section for entering first data of an ion measured by mass spectrometry, a second input section for entering second data of a dissociated ion of the ion measured by mass spectrometry, a first data storing section for storing third data of mass spectrometry of a plurality of candidates for the structure of ion, a calculation section for producing fourth data of mass spectrometry of dissociated ions to be used in analyzing the plurality of candidates and an evaluation section for evaluating the plurality of candidates by making comparisons between the first and third data and between the second and fourth data, so that the structure of ion can be identified.

System for analyzing compound structure

A system for analyzing mass spectrometric data is provided, which has an data input means for entering mass spectrometric data of a parent ion and dissociated ions resulting from multiple dissociation of the parent ion, and an analytical means for providing characteristics of a candidate for estimated structure of a precursor ion that is representative of pre-dissociation structure at each stage of dissociation. The system analyzes one of the structure of precursor ion at each stage of dissociation and the structure of parent ion based on the characteristics and spectrometric data.

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Tokyo, Japan

Atsushi Otake