Mitsubishi Rayon Company, Limited

Atsushi Ootake

Hikaru Momose

Akifumi Ueda

Tadashi Nakamura

Tadayuki Fujiwara

Takeshi Iwai

Masaru Takeshita

Ryotaro Hayashi

Yoshihiro Kamon

Ryuichi Ansai

Hideaki Kuwano

To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.  In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n&#x2267;3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; Kand Keach represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; Land Leach represent at least one selected from &#x2014;C(O)O&#x2014;, &#x2014;C(O)&#x2014; and &#x2014;OC(O)&#x2014;; M, Mand Meach represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Yand Yeach represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and Rrepresents H or a methyl group.

Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer

The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Resist polymer and resist composition

To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n&#x2267;3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; Kand Keach represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; Land Leach represent at least one selected from &#x2014;C(O)O&#x2014;, &#x2014;C(O)&#x2014; and &#x2014;OC(O)&#x2014;; M, Mand Meach represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Yand Yeach represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, m3 and n1 each represent 0 or 1; and Rrepresents H or a methyl group.

A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.

(Meth)acrylate, polymer and resist composition

A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein Rrepresents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; Rrepresents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or Rand Rrepresent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, and a carboxy group esterified with an alcohol containing 1 to 6 carbon atoms.

5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process

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Saitama, Japan

Atsushi Ootake