Mitsubishi Gas Chemical Company, Inc.

Atsushi Okoshi

Kazuo Tanaka

Hiroshi Ogawa

Go Higashihara

Masatoshi Echigo

Takeshi Koyama

Takashi Makinoshima

Masato Inari

Takao Ota

Ryuji Ideno

Kana Okada

Tomohiro Sugawara

Masashi Yabuno

Takashi Sato

Shuichi Ueno

Fumiya Zaima

Kinji Kato

Kengi Nakaya

Etsuo Urabe

Ikutraro Maruki

A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, Rrepresents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each Rindependently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each mis independently an integer of 0 to 4, in which at least one mis an integer of 1 to 4, each mis independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).

Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst. wherein R represents an organic group having 1 to 10 carbon atoms; l represents an integer of 0 to 2, and m and n represent integers satisfying 1&#x2266;m+n&#x2266;10, m&#x2267;0 and n&#x2267;1.

Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing these

There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst. wherein R represents an organic group having 1 to 10 carbon atoms; m and n represent integers satisfying 1&#x2266;m+n&#x2266;10, m&#x2267;0 and n&#x2267;1.

Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and methods for producing these

A curing agent for epoxy resins which comprises cyclohexanetricarboxylic acid anhydride (A) comprising trans,trans-1,2,4-cyclohexanetricarboxylic acid 1,2-anhydride expressed by formula (1) and aliphatic dicarboxylic acid anhydride (B) and an epoxy resin composition which comprises the curing agent and an epoxy resin are provided. The curing agent of the present invention can be handled easily since the curing agent is liquid at the ordinary temperature, exhibits an excellent curing property without addition of a curing accelerator and provides a cured product of an epoxy resin exhibiting excellent transmission of light and heat stability. The epoxy resin composition can be advantageously used for coating materials, adhesives, molded products, resins for encapsulating photo-semiconductors and coating fluids for protective films of color filters constituting liquid crystal display devices (LCD), solid state imaging devices (CCD) and electroluminescence (EL) devices. 

Curing agent for epoxy resins and epoxy resin compositions

The present invention provides an acid anhydride ester obtained by esterifying cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride and a composition of the ester, and a heat-curable resin composition and a cured product of the composition. _Provided is an epoxy resin composition using the acid anhydride ester as a curing agent for an epoxy resin, the epoxy resin composition having, for example, the following properties (1), (2), and (3): (1) the epoxy resin composition has a low viscosity at room temperature, so the components of the composition can be favorably blended with each other, (2) the acid anhydride ester has a low vapor pressure at curing temperature, so no evaporation loss occurs after curing, and the intended design of blend is capable, and (3) a cured product to be made from the composition is colorless and transparent, and changes its color to a small extent even when the product is irradiated with light or heated for a long time period. The composition is suitably used as, for example, an encapsulant for a photoelectric conversion element such as a blue LED or a white LED, a molded article, a coating, or an adhesive.

Acid anhydride ester and composition thereof, and heat-curable resin composition and cured product thereof

Trans, trans-1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride represented by the following formula 1: a cyclohexanetricarboxylic anhydride being liquid at ordinary temperatures which contains such a anhydride, and a production method thereof. The cyclohexanetricarboxylic anhydride being liquid at ordinary temperatures is produced by melting 1,2,4-cyclohexanetricarboxylic acid and/or 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride at 180 to 300&#xb0; C. under heating. Since the cyclohexanetricarboxylic anhydride is liquid at ordinary temperatures, it is advantageously used in industrial applications such as raw materials or modifiers for coating compositions, adhesives, shaped articles, sealing resins for photosemiconductors, curing agents and polyimide resins, raw materials for plasticizers and lubricant oils, intermediates for medicines and agricultural chemicals, raw material for coating resins, raw material for toner resins, etc.

Liquid cyclohexane-tricarboxylic acid anhydride

A method of producing pyromellitic dianhydride. The method includes a step of heating a crude pyromellitic acid in the absence of acetic anhydride to convert a part of pyromellitic acid to pyromellitic anhydride, and a subsequent step of heating the resultant mixture in the presence of acetic anhydride to complete the anhydrization of pyromellitic acid. The pyromellitic dianhydride by the method contains little pyromellitic monoanhydride and other monoanhydrides derived from impurities and is less discolored. The pyromellitic dianhydride has particle properties not causing plugging, etc. during its transportation, storage and use.

Production method of highly pure pyromellitic dianhydride

The cyclohexanetricarboxylic monoester of the present invention is represented by the following formula 1: wherein R is as defined in the specification. The cyclohexanetricarboxylic monoester is useful particularly as the curing agent for epoxy-containing compounds. A heat-curable resin composition comprising the cyclohexanetricarboxylic monoester and an epoxy-containing compound exhibits an excellent curability without using a curing accelerator and provides a colorless transparent cured product which is little discolored even under a long-term exposure to high-temperature conditions. Such a heat-curable resin composition is suitable as sealing materials for photoelectric transducers such as blue LED and white LED, shaped articles, coating materials, adhesives, etc.

Cyclohexanetricarboxylic monoester and its use

In the production of an alicyclic aldehyde, a starting aromatic aldehyde is converted into an aromatic acetal for protecting the formyl group. The aromatic ring of the aromatic acetal is then hydrogenated to convert the aromatic acetal into an alicyclic acetal, which is then hydrolyzed to cleave the acetal protecting group to obtain the aimed alicyclic aldehyde.

Process for producing alicyclic aldehydes

A process for producing pyromellitic acid which comprises oxidizing 2,4,5-trimethylbenzaldehyde and/or its oxidized derivative in the presence of a catalyst containing iron, manganese and bromine, or additionally containing zirconium or cerium continuously or semi-continuously using aqueous acetic acid solvent and 0.05-2% by weight of bromide ion. The catalyst used in the present invention has high activity, and the catalyst solution has low corrosive because the reaction is performed at low bromide concentration by using a solvent of aqueous acetic acid. So pyromellitic acid is produced industrially advantageously in high yield continuously or semi-continuously which has been a major difficulty up to now.

Process for producing pyromellitic acid

A process for refined pyromellitic anhydride which comprises dissolving crude pyromellitic acid or crude pyromellitic anhydride in water, then cooling an aqueous solution thus obtained to perform crystallization as pyromellitic acid, then separating a crystal thus obtained from water, then anhydrating the crystal of pyromellitic acid thus separated with heating to produce pyromellitic anhydride, then vaporizing pyromellitic anhydride thus produced, cooling vapor of pyromellitic anhydride thus obtained, and thereby, recovering a refined crystal of pyromellitic anhydride.

Process for producing refined pyromellitic acid and refined pyromellitic anhydride

What is disclosed is a process for producing &egr;-caprolactone which comprises removing impurities by distillation from a reaction mixture obtained by co-oxidation of cyclohexanone and aldehyde, wherein &egr;-caprolactone separated from a purifying column is contacted with oxygen containing gas in the presence of cobalt. High boiling point components are removed to give an acid value of lower than 0.15 mgKOH/g. Thereby, a high quality &egr;-caprolactone providing improved polymer appearance is produced advantageously on an industrial scale without repeated purifying distillations or without using expensive stabilizer or adsorbent for the improvement of color.

Process for producing &egr;-caprolactone

A process for producing a polycarboxylic acid which comprises performing liquid phase oxidation of polyalkyl-substituted aromatic aldehyde and/or oxide derivative of polyalkyl-substituted aromatic aldehyde as raw material for oxidation with molecular oxygen at two stages in water solvent in the presence of a catalyst comprising bromine or both bromine and a heavy metal(s) at a temperature of 180 to 280 &deg; C., thereby producing trimellitic acid or pyromellitic acid, wherein said liquid phase oxidation is performed in a continuous operation at the first stage and in a continuous operation or in a batch operation at the second stage and a total amount of bromine in said catalyst is divided to add separately at each the first stage and the second stage.

Process for producing aromatic polycarboxylic acid

A process for producing purified .epsilon.-caprolactone from an .epsilon.-caprolactone-containing reaction product produced by the oxidation of cyclohexanone comprising subjecting the .epsilon.-caprolactone-containing reaction product to an alkali-treatment in the presence of an inert gas atmosphere or to a heat treatment in the presence of an inert gas atmosphere or to a combined alkali-treatment and heat treatment, and distilling the treated reaction product.

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Okayama, Japan

Atsushi Okoshi