Kokusai Electric Corporation

Hitachi-Kokusai Electric Inc.

Atsushi Morikawa

Masakazu Shimada

Kenichi Suzaki

Hirohisa Yamazaki

Yoshimasa Nagatomi

Takeshi Kasai

Yuji Takebayashi

A vaporization system includes a vaporization chamber having a first portion and a second portion. A first fluid supply part is connected to the first portion of the vaporization chamber, and configured to supply a mixed fluid in which a first carrier gas and a liquid precursor are mixed, toward the second portion. A second fluid supply part is configured to supply a second carrier gas toward the mixed fluid at the second portion.

Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device

Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer

A substrate processing apparatus includes a process chamber in which a substrate is accommodated; a source gas supply system configured to supply a source gas onto the substrate; first and second reactive gas supply systems configured to supply a reactive gas onto the substrate via first and second interconnected reactive gas supply pipes, wherein a gas storage unit is installed at the second reactive gas supply pipe to store the reactive gas and the reactive gas is supplied onto the substrate via the gas storage unit; and a control unit configured to control the source gas supply system to supply the source gas onto the substrate and to control the first and second reactive gas supply systems to supply the reactive gas onto the substrate via the first and second reactive gas supply pipes.

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Growing community of inventors

Toyama, Japan

Atsushi Morikawa