Murata Manufacturing Co., Ltd.

Renesas Technology Corp.

Ricoh Company, Ltd.

Hitachi, Ltd.

Renesas Electronics Corporation

Sharp Kabushiki Kaisha Corporation

Lintec Corporation

Atsushi Kurokawa

Yasunari Umemoto

Masao Yamane

Yoshinori Imamura

Masaaki Yamada

Hiroshi Inagawa

Shigeki Koya

Hideki Kosugi

Toshiaki Kitahara

Yasuyuki Ishii

Tetsuro Hirota

Chushiro Kusano

Hiroaki Tokuya

Kazuya Kobayashi

Masayuki Yamane

Kazuhiro Mochizuki

Masahiro Shibata

Hideyasu Seki

Masayuki Aoike

Isao Ohbu

Yoshiko Ogawa

Yuichi Sano

Isao Obu

Keiichi Yoshida

Toshiki Hayashi

Shinya Osakabe

Tatsuya Ohhira

Yuji Ishikura

Takayuki Tsutsui

Yasushi Shigeno

Mari Saji

Hiroyuki Takazawa

Koshi Himeda

Eigo Tange

Yuuki Tsuchiya

Tsunekazu Saimei

Yoshinori Nakagawa

Masanori Horike

Tomonori Tanoue

Shin Kayahara

Fumio Harima

Yuuji Ishikura

Atsushi Kobayashi

Satoshi Tanaka

Hiroyuki Sugiyama

Hiroshi Nakai

Kenji Sasaki

Tokio Taguchi

Masanori Kawasumi

Kazuhisa Sudo

Hidetoshi Matsumoto

Takayuki Arai

Shunji Katoh

Hideyuki Ono

Satoshi Goto

Katsuhiro Aoki

Ichiro Kadota

Kenichi Shimamoto

Ryuji Yoshida

Satoru Shoshi

Shuji Tanaka

Shigekazu Enoki

Masami Ohnishi

Satoshi Sasaki

Daisuke Tokuda

Yuuki Satoh

Tatsuhiko Ikeda

Osamu Endou

Hirokazu Nakajima

Naoyuki Ozaki

Takuya Suganuma

Satoru Konishi

Yuichi Saito

Takayuki Kawano

Hideyuki Sato

Toshihiro Tada

Hiroki Atari

Ryoki Shikishima

Ikuro Akazawa

Tsuneo Endo

Yasuo Ohsone

Akihiko Ozaki

A semiconductor apparatus includes a substrate, plural transistor groups disposed on the substrate, an insulating film, and a metal member. Each of the plural transistor groups includes plural unit transistors arranged in a first direction within a plane of a top surface of the substrate. The plural transistor groups are arranged in a second direction perpendicular to the first direction. The insulating film covers the plural unit transistors and includes at least one cavity. The metal member is disposed on the insulating film and is electrically connected to the plural unit transistors via the at least one cavity. A heat transfer path is formed by a metal in a region from each of the plural unit transistors to a top surface of the metal member. Thermal resistance values of the heat transfer paths are different from each other among the plural unit transistors.

Semiconductor apparatus including different thermal resistance values for different heat transfer paths

A mesa portion is formed on a substrate. An insulating film including an organic layer is disposed on the mesa portion. A conductor film is disposed on the insulating film. A cavity provided in the organic layer has side surfaces extending in a first direction. A shorter distance out of distances in a second direction perpendicular to the first direction from the mesa portion to the side surfaces of the cavity in plan view is defined as a first distance. A shorter distance out of distances in the first direction from the mesa portion to side surfaces of the cavity in plan view is defined as a second distance. A height of a first step of the mesa portion is defined as a first height. At least one of the first distance and the second distance is greater than or equal to the first height.

Semiconductor device

A semiconductor device includes a substrate having an upper surface on which are arranged first transistors each including a mesa structure formed of a semiconductor. A first bump having a shape elongated in one direction in plan view and connected to the first transistors is arranged at a position overlapping the first transistors in plan view. A second bump has a space with respect to the first bump in a direction orthogonal to a longitudinal direction of the first bump. A first metal pattern is arranged between the first and second bumps in plan view. When the upper surface of the substrate is taken as a height reference, a center of the first metal pattern in a thickness direction has a height higher than an upper surface of the mesa structure included in each of the first transistors and lower than a lower surface of the first bump.

A target element to be protected and a protrusion are arranged on a substrate. An insulating film arranged on the substrate covers the target element and at least a side surface of the protrusion. An electrode pad for external connection is arranged on the insulating film. The electrode pad at least partially overlaps the target element and the protrusion as seen in plan view. A maximum distance between the upper surface of the protrusion and the electrode pad in the height direction is shorter than a maximum distance between the upper surface of the target element and the electrode pad in the height direction.

Semiconductor device with protective protrusion

A first layer conductor film is connected to an operation electrode through an opening in a first layer interlayer insulating film. An opening in a second layer interlayer insulating film is encompassed by the first layer conductor film in plan view. A second layer conductor film is connected to the first layer conductor film through the opening in a second layer interlayer insulating film. The average, along a first direction, of distances in a second direction, which is perpendicular to the first direction, from the opening in the first layer interlayer insulating film to the side surface of the opening in the second layer interlayer insulating film is greater than or equal to a distance in a height direction from an upper opening plane of the opening in the first layer interlayer insulating film to a lower opening plane of the opening in the second layer interlayer insulating film.

A power amplifier circuit includes a first transistor disposed on a semiconductor substrate; a second transistor disposed on the semiconductor substrate and configured to supply a bias current based on a first current which is a part of a control current to the first transistor; a third transistor disposed on the semiconductor substrate and having a collector configured to be supplied with a second current which is a part of the control current and an emitter configured to output a third current based on the second current; a first bump electrically connected to an emitter of the first transistor and disposed so as to overlap a first disposition area in which the first transistor is disposed in plan view of the semiconductor substrate; and a second bump disposed so as to overlap a second disposition area in which the third transistor is disposed in the plan view.

Power amplifier circuit and semiconductor device

A bipolar transistor comprising a subcollector layer, and a collector layer on the subcollector layer. The collector layer includes a plurality of doped layers. The plurality of doped layers includes a first doped layer that has a highest impurity concentration thereamong and is on a side of or in contact with the subcollector layer. Also, the first doped layer includes a portion that extends beyond at least one edge of the plurality of doped layers in a cross-sectional view.

Bipolar transistor and method for producing the same

At least one unit transistor is arranged over a substrate. A first wiring as a path of current that flows to each unit transistor is arranged over the at least one unit transistor. An inorganic insulation film is arranged over the first wiring. At least one first opening overlapping a partial region of the first wiring in a plan view is provided in the inorganic insulation film. An organic insulation film is arranged over the inorganic insulation film. A second wiring coupled to the first wiring through the first opening is arranged over the organic insulation film and the inorganic insulation film. In a plan view, a region in which the organic insulation film is not arranged is provided outside a region in which the first wiring is arranged. The second wiring is in contact with the inorganic insulation film outside the region in which the first wiring is arranged.

Semiconductor device and high-frequency module

A semiconductor device includes an HBT; emitter wiring which is connected to an emitter electrode of the HBT and covers the HBT; a passivation film having an opening on the HBT in plan view; a UBM layer which is connected to the emitter wiring through the opening and made of a refractory metal with a thickness of 300 nm or more; and a pillar bump which is arranged on the UBM layer and includes a metal post and a solder layer. The UBM layer serves as a stress relaxation layer, thereby relaxing stress on the HBT due to a difference in thermal expansion coefficient between a GaAs-based material of each layer constituting the HBT and the pillar bump.

A dielectric film is disposed on a semiconductor substrate, and a conductor including a bent section is arranged between the semiconductor substrate and the dielectric film. A pad is disposed on the dielectric film. The pad is covered with a protective film. The protective film has an opening through which an upper surface of the pad is exposed. The bent section in the conductor and the pad overlap each other as seen in plan view, and an inside corner and an outside corner in the bent section are chamfered.

A semiconductor chip is mounted on a substrate in a face-down manner. A metal film is arranged on a back surface of the semiconductor chip facing an opposite side from the substrate away from an edge of the back surface. A sealing resin layer seals the semiconductor chip with a part of the metal film being exposed from the sealing resin layer.

Semiconductor device and method for manufacturing semiconductor device

A bipolar transistor has a subcollector layer and a stack of collector, base, and emitter layers on the subcollector layer. On the subcollector layer are collector electrodes. On the base layer are base electrodes. The collector layer includes multiple doped layers with graded impurity concentrations, higher on the subcollector layer side and lower on the base layer side. Of these doped layers, the one having the highest impurity concentration is in contact with the subcollector layer and has a sheet resistance less than or equal to about nine times that of the subcollector layer.

Transistors including semiconductor regions where operating current flows are provided above a substrate. Operating electrodes of conductive material having thermal conductivity higher than the semiconductor regions and contacting the semiconductor regions to conduct operating current to the semiconductor regions are disposed. A conductor pillar for external connection contains contact regions where the semiconductor regions and the operating electrodes contact, and is electrically connected to the operating electrodes. The contact regions are disposed in a first direction. Each contact region has a planar shape long in a second direction orthogonal to the first direction. A first average distance, obtained by averaging distances in the second direction from each end portion of the contact region in the second direction to an edge of the conductor pillar across the contact regions, exceeds an average distance value in a height direction from the contact region to a top surface of the conductor pillar.

A semiconductor element includes a semiconductor substrate; a collector layer on the semiconductor substrate; a base layer on the collector layer; an emitter layer on the base layer; emitter wiring electrically coupled to the emitter layer; a top metal layer on the emitter wiring; a first protective film covering the emitter wiring and the top metal layer, the first protective film having a first opening that overlaps at least the collector layer; and a bump including an under-bump metal layer electrically coupled to the emitter wiring via the first opening, the under-bump metal layer being larger than the first opening in plan-view area. The first protective film has an inner edge around the first opening, and the inner edge is on the top metal layer.

Semiconductor element

Growing community of inventors

Takasaki, Japan

Atsushi Kurokawa