Jsr Corporation

Sumitomo Chemical Company, Limited

Dai Nippon Printing Co., Ltd.

Kuraray Co., Ltd.

Toppan Printing Co., Ltd.

Konica-minolta Holdings, Inc.

Dainippon Ink and Chemicals, Incorporated

Sumitomo Bakelite Company Limited

Nec Corporation

Toray Industries, Inc.

Hitachi Chemical Company, Ltd.

Atsushi Kumano

Nobuo Bessho

Kenji Yamada

Isao Nishimura

Hiroaki Nemoto

Tsutomu Shimokawa

Kouichi Sakurai

Ken Sumiyoshi

Kazushige Takechi

Noboru Oshima

Akimitsu Tsukuda

Ichiro Fujieda

Yoshiyuki Ono

Shigeru Abe

Motoyuki Suzuki

Katsuya Fujisawa

Hisatomo Yonehara

Hideaki Masuko

Tadahiko Udagawa

Yoshiki Matsuoka

Toshimasa Eguchi

Tokuo Ikari

Masaaki Hanamura

Kazuo Genda

Shigenori Yamaoka

Tatsumi Takahashi

Norimasa Sekine

Yasuo Tsuruoka

Kenji Okamoto

Michinori Nishikawa

Yong Wang

Keiji Konno

Shinji Shiraki

Jiro Takahashi

Shigeo Shimizu

Kouji Itano

Yasuaki Mutsuga

Tomio Nagatsuka

Satoshi Shimada

Hideyuki Kamii

A conventional liquid crystal display comprises a number of components, so that a manufacturing cost cannot be reduced. Furthermore, a large-area substrate has problems in shipping. According to this invention, a liquid-crystal panel is prepared by forming individual optically functional films, a TFT device and a light-emitting device on a long thin film and then laminating the film by a transfer process. A base film to be a substrate in a liquid-crystal panel preferably has a thickness of 10 &#x3bc;m to 200 &#x3bc;m, a curvature radius of 40 mm or less as a measure of flexibility and a coefficient of thermal expansion of 50 ppm/&#xb0; C. or less. Furthermore, it more preferably gives a variation of &#xb1;5% or less in mechanical and optical properties to a thermal history at 200&#xb0; C.

Light-condensing film, liquid-crystal panel and backlight as well as manufacturing process for light-condensing film

There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.

Method for forming pattern, and optical element

There is provided a radiation sensitive refractive index changing composition containing an inorganic oxide particle, a polymerizable compound, a radiation sensitive decomposer and an escapable compound. The radiation sensitive decomposer decomposes upon exposure to radiation to form an acid, base or radical, and this decomposed product increases the molecular weight of the polymerizable compound.

Radiation sensitive refractive index changing composition, pattern forming method and optical material

A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer. The composition allows its dielectric constant to be changed by a simple method, has a sufficiently large difference between its changed dielectric constant and its original dielectric constant and can provide a dielectric constant pattern and an optical material which are stable regardless of their use conditions.

Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern

To provide a refractive index pattern and an optical material whose refractive indices are changed by a simple method, which have a sufficiently large refractive index difference and which are stable irrespective of their use conditions, and a method of forming these. A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium or tetramethoxysilane, or a halogen compound such as tetrachlorosilane and (C) a radiation sensitive decomposer; and a method of producing a refractive index pattern and an optical material, using the above radiation sensitive refractive index changing composition.

Radiation-sensitive composition changing in refractive index and utilization thereof

A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

Radiation-sensitive composition changing in refractive index and method of changing refractive index

A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

Radiation-sensitive composition capable of having refractive index distribution

A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern

Radiation sensitive refractive index changing composition and refractive index changing method

Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3&prime;,5&prime;-di-t-butyl-4&prime;-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.

Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition

A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Radiation sensitive composition

A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

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Tokyo, Japan

Atsushi Kumano