Mitsubishi Rayon Company, Limited

Atsushi Koizumi

Tadayuki Fujiwara

Hikaru Momose

Hideaki Kuwano

Toshihiko Fukuda

Yuji Fujimori

Kazunori Matake

Disclosed is a method for enhancing a yield of an &#x3b1;,&#x3b2;-unsaturated carboxylic acid obtained by liquid-phase oxidation reaction of an olefin or an &#x3b1;,&#x3b2;-unsaturated aldehyde. In particular, there is provided a method for producing an &#x3b1;,&#x3b2;-unsaturated carboxylic acid, wherein the method includes the step of carrying out oxidation reaction of an olefin or an &#x3b1;,&#x3b2;-unsaturated aldehyde in a liquid phase to obtain a reaction mixture containing an &#x3b1;,&#x3b2;-unsaturated carboxylic acid and an &#x3b1;,&#x3b2;-unsaturated carboxylic acid anhydride and the step of bringing the &#x3b1;,&#x3b2;-unsaturated carboxylic acid anhydride into contact with an alcohol or water to obtain an &#x3b1;,&#x3b2;-unsaturated carboxylic acid resulting from decomposition of the &#x3b1;,&#x3b2;-unsaturated carboxylic acid anhydride.

Process for producing &#x3b1;,&#x3b2;-unsaturated carboxylic acid

A (meth)acrylate represented by the following formula (1): 

(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern

A (meth)acrylate represented by the following formula (): wherein each of R, R, Rand Rrepresents a hydrogen atom, a methyl group or an ethyl group; either one of Xor Xrepresents a (meth)acryloyloxy group and the other represents a hydrogen atom; both Aand Arepresent hydrogen atoms, or Aand Aform &#x2014;O&#x2014;, &#x2014;CH&#x2014; or &#x2014;CHCH&#x2014;, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.

(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns

Growing community of inventors

Hiroshima, Japan

Atsushi Koizumi