Honda Motor Co., Ltd.

Sumitomo Osaka Cement Co., Ltd.

Atsushi Kishimoto

Masamichi Tanaka

Keita Ishizaki

Tadashi Neya

Katsunori Hanamura

According to the present invention, there is provided an exhaust gas purifying filter capable of effectively removing collected particulate matter. An exhaust gas purifying filter of the present invention includes an inflow surface into which exhaust gas including particulate matter flows, an exhaust surface which exhausts purified gas, and a filter substrate which is constructed of a porous body, wherein the filter substrate includes porous partitions and gas passages which are enclosed by the partitions, and a porous film, which includes silicon carbide and pores having a smaller pore diameter than the pores of the partitions, is provided on the surface of the partitions, and a silicon dioxide layer is formed on at least an outer surface portion of the porous film.

Exhaust gas purifying filter

An object is to provide an exhaust gas purification filter that can achieve high trapping efficiency of particulate matter and low pressure loss, and the exhaust gas purification filter includes an inflow surface through which exhaust gas containing particulate matter flows in, a discharge surface from which purified gas is discharged, and a filter base body that is formed from a porous body, wherein the filter base body includes porous partition walls and gas flow paths surrounded by the partition walls, a porous film having a pore size smaller than that of pores of the partition walls is provided on each surface of the partition walls, and microgrooves having a depth shallower than the thickness of the porous film are formed on at least a part of a surface of the porous film.

Exhaust gas purification filter, and method of manufacturing exhaust gas purification filter

There is provided an exhaust gas purifying filter, which includes an inflow surface into which exhaust gas including particulate matter flows, an exhaust surface from which purified gas is exhausted, and a filter substrate which is constructed of a porous body, the filter substrate including a porous partition and a gas passage which is enclosed by the porous partition, a porous film which includes silicon carbide is provided on a surface of the porous partition, and in a pore diameter distribution of the porous film, pores with the pore diameter of 0.01 &#x3bc;m or more and 3.0 &#x3bc;m or less are 70% or more of total volume of the pores, and pores with the pore diameter of 0.01 &#x3bc;m or more and 0.3 &#x3bc;m or less are 5% or more and 90% or less of total volume of the pores.

Growing community of inventors

Tokyo, Japan

Atsushi Kishimoto