Sanyo Special Steel Co., Ltd.

Atsushi Kishida

Toshiyuki Sawada

Akihiko Yanagitani

Hiroyuki Hasegawa

There is disclosed a sputtering target material for producing an intermediate layer film of a perpendicular magnetic recording medium, which is capable of dramatically reducing the crystal grain size of a thin film formed by sputtering. The sputtering target material comprises, in at %, 1 to 20% of W; 0.1 to 10% in total of one or more elements selected from the group consisting of P, Zr, Si and B; and balance Ni.

Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same

There is provided a soft magnetic alloy for a perpendicular magnetic recording medium having a low coercive force, high amorphous properties, high corrosion resistance, and a high hardness; and a sputtering target for producing a thin film of the alloy. The alloy comprises in at. %: 6 to 20% in total of one or two of Zr and Hf; 1 to 20% of B; and 0 to 7% in total of one or two or more of Ti, V, Nb, Ta, Cr, Mo, W, Ni, Al, Si, and P; and the balance Co and/or Fe and unavoidable impurities. The alloy further satisfies 6&#x2266;2&#xd7;(Zr%+Hf%)&#x2212;B%&#x2266;16 and 0&#x2266;Fe%/(Fe%+Co%)&#x3c;0.20.

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Himeji, Japan

Atsushi Kishida