Hoya Corporation

Caterpillar Sarl

Atsushi Kawaguchi

Masaru Tanabe

Hiroyuki Akagawa

Osamu Suzuki

Akihiro Kawahara

Naozumi Ishibashi

Jun Tanaka

Atsunori Shimamoto

Kenji Yokohata

Daizo Morita

Power supply device includes a power supply circuit with a low voltage load circuit and a high voltage load circuit connected to a plurality of batteries connected in series. A power supply circuit includes an equalizer that can prevent uneven consumption of each battery; a disconnect switch that enables the battery on the low voltage side to be electrically cut off; and a disconnect relay that enables the battery on the high voltage side to be electrically cut off. A machine controller starts an engine controller by turning on an engine key relay after turning on the disconnect relay.

Power supply device for vehicles

A fuel supply apparatus able to stop actuating of a fuel supply pump when the fuel supply is stopped or becomes slow, includes a control section which calculates an amount of the fuel in the fuel tank based upon a signal from a fuel gauge, and outputs the result to a fuel meter. The control section also calculates from the fuel gauge signal the amount of the fuel supplied into the fuel tank per unit of time, and if the amount of the fuel supplied per unit of time is determined to be less than a set supply rate, the fuel supply pump is stopped so that a malfunction of the fuel supply can be detected without mounting a special fuel supply sensor.

Fuel supply apparatus in construction machine

A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates.

Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method

In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 &#x3bc;m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.

Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method

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Tokyo, Japan

Atsushi Kawaguchi