Horiba Stec, Co., Ltd.

Ckd Corporation

Atsushi Ieki

Kotaro Takijiri

Yuki Tanaka

Shigeyuki Hayashi

Yasunori Nishimura

Minoru Ito

Hiroyuki Okano

Akiko Nakada

Daichi Kunita

Masami Nishikawa

In a flow path forming structure, axial runout of a shaft relative to a central axis generated when the shaft is inserted into the flow path is suppressed. This structure includes a flow path along which a fluid passes, and a shaft body that is inserted into the flow path. An upstream side of the shaft body and an inner circumferential surface of the flow path have a plurality of contact positions at different phases, and a downstream side of the shaft body and an inner circumferential surface of the flow path have a plurality of contact positions at different phases. The fluid flows through gaps between the shaft body and the inner circumferential surface. The contact positions on one of the upstream and downstream sides are at different phases from all of the contact positions on the other one of the upstream and downstream sides.

Flow path forming structure, flow rate measuring device and flow rate control device

In order to suppress changes in opening level and flow rate associated with the thermal expansion of a resin member caused by a temperature change, a valve device that displaces a valve body by applying drive voltage to an actuator is adapted to include: a position sensor that detects the position of the valve body; a voltage regulator that regulates the drive voltage on the basis of a detected position by the position sensor; and a temperature sensor that detects the temperature of the valve body. In addition, the seating surface of the valve body is adapted to be formed of a resin member, and the voltage regulator is adapted to change the setting value of the drive voltage depending on detected temperature by the temperature sensor.

Valve device and valve control device

The present invention provides a fluid control valve that improves usability by eliminating misunderstanding of a user. The fluid control valve includes a valve seat, a valve body disposed to be approachable to and separable from the valve seat, an actuator configured to move the valve body in an approaching or separating direction, a positional information detection part configured to detect a value corresponding to a relative position of the valve body with respect to the valve seat, and a position output part configured to set, irrespective of positional information acquired by the positional information detection part at an opening start position of the valve body, the opening start position to position zero.

Fluid control valve and recording medium with control program thereof recorded therein

An operator is able to easily perform down-tuning while still achieving superior responsiveness and, in some cases, obtain an equivalent responsiveness as that obtained from the flow rate control device currently being used. In a flow rate control device that performs feedback control of a fluid control valve such that a measured flow rate closely approximates a target flow rate, there are provided a response lag input section that inputs a response lag set value, which is a value showing a response lag that an operator wishes to set, and a response lag generating section that generates response lags used in the feedback control in accordance with the response lag set values.

Flow rate control device

In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.

Gas flow monitoring method and gas flow monitoring apparatus

In order to keep a stable flow rate at a set flow rate value when a pressure fluctuation occurs in an upstream side of a valve, without providing an additional sensor for detecting a pressure fluctuation, a flow rate control apparatus is provided with: the valve; a flow rate sensor; a valve control part configured to control the valve so that a deviation between a set flow rate value and a measurement flow rate value is reduced, on the basis of the deviation and a set control coefficient; and a control coefficient setting part configured to set the control coefficient so that when a pressure rise occurs in the upstream side of the valve, a decreased amount in flow due to a decreased opening of the valve and an increased amount in flow due to an increased amount of a differential pressure before and after the valve, are balanced.

Growing community of inventors

Kyoto, Japan

Atsushi Ieki