Toyo Ink Manufacturing Company

Iida Group Holdings Co., Ltd.

Atsushi Hirokawa

Kunihiko Ozaki

Toshinori Machida

Fusao Ito

Kazuhiko Mori

Yusuke Minagawa

Masahiro Kikuchi

Yoichi Nishikawa

Ayumu Watanabe

A construction block and a wall face structure with high durability and versatility are provided. The construction block including: a front face wall and a rear face wall being parallel to each other; a top face wall with a horizontal groove formed for inserting a horizontal reinforcement; side face walls formed with at least one vertical groove for inserting a vertical reinforcement; at least one vertical hole formed between both of the side face walls and closed off by the top face wall and opened at a bottom face; a plurality of protrusions formed on the bottom face in a shape to engage with the horizontal groove; and recessed slits respectively formed in vertical direction on each side face of the front face wall and the rear face wall, is used.

Construction block and wall face structure using same

A base film having dimensional stability and high transparency, which comprises (A) a plastic film having on either one or both sides thereof (B) a thin film layer comprising (1) an oxide of silicon and (2) a fluoride of alkaline earth metal, or comprising (1) an oxide of silicon, (2) a fluoride of alkaline earth metal, and (3) an oxide of magnesium, the thin film layer (B) being formed by a vacuum film forming process. A photographic light-sensitive material comprising the base film having dimensional stability and high transparency, having on either one or both sides thereof (C) a photographic layer.

Base film having dimensional stability and high transparency and

Base film having dimensional stability and high transparency, and

A process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a traveling flexible plastic film. The process comprises evaporating a deposition material composed mainly of silicon and silicon oxide or silicon oxide alonem by heating to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface(s) of a travelling flexible plastic film, wherein a material shaped from the above deposition material is evaporated by heating while the material is supplied to a heat evaporating portion substantially continuously, and an evaporation residue is discharged from the heat evaporating portion substantially continuously.

Process and apparatus for the substantially continuous manufacture of a

An apparatus for use in a process for the substantially continuous manufacture of a silicon oxide deposition film by evaporating a deposition material composed mainly of a combination of silicon and silicon oxide or silicon oxide alone by heating the material to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface of a travelling flexible plastic film. The apparatus comprises a vacuum chamber and, within the vacuum chamber, a means to allow a flexible plastic film to travel continuously, a heat evaporation member having a means to hold a shaped deposition material and a means to evaporate the shaped deposition material, the holding means having a supply port for the shaped deposition material, an outlet for evaporation residue and an opening for evaporation of the deposition material, and the means to substantially continuously supply the shaped deposition material being connected to the supply port to the heat evaporation member and to substantially continuously discharge evaporation residue from the heat evaporation member.

Process for the manufacture of deposition films and apparatus therefor

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Tokyo, Japan

Atsushi Hirokawa