Fujitsu Corporation

Atsushi Furuya

Koichi Shimizu

Junichi Ishimine

Yuji Uehara

Hirotaka Oshima

Tetsuyuki Kubota

Nobuyoshi Yamaoka

Akihiko Fujisaki

Yuji Ohba

Tomoko Kutsuzawa

Jun Fujisaki

Tadashi Ataka

Hideyuki Shitara

A device includes a memory that stores a measurement-result of a first magnetization of a permanent-magnet corresponding to an external-magnetic field in an open-magnetic circuit; and a processor to divide the permanent-magnet into meshes, generate a function based on the measurement-result, the function indicating a second magnetization corresponding to the external-magnetic field in a closed-magnetic circuit, the function including a parameter having a value, calculate a diamagnetic-field corresponding to the external-magnetic field based on the second magnetization for each of the meshes, calculate a third magnetization of the permanent-magnet, calculate an average of the third magnetizations, calculate an error between the first magnetization and the calculated average, correct the value of the parameter, and repeat the calculation of the second magnetization, the diamagnetic-field, the third magnetizations, the average, and the error, and the correction of the value of the parameter until the error falls below a threshold.

Information processing device, closed magnetic circuit computing method, and closed magnetic circuit computing system

A magnetization analysis apparatus includes a processor configured to execute a process. The process includes: first calculating, using a magnetization vector of each of elements obtained by mesh division in which a magnetic substance is divided into a plurality of meshes and a magnetization vector of an element adjacent to each element, intermediate magnetization that is a magnetization vector at the halfway point between each element and an element adjacent to each element; second calculating an effective magnetic field using the intermediate magnetization calculated at the first calculating; and third calculating a magnetization vector of each element after a unit time based on the effective magnetic field calculated at the second calculating.

Magnetization analysis apparatus, magnetization analysis method, and recording medium

A computer-readable medium stores a magnetic substrate simulation program causing a computer to execute a process that includes calculating an effective magnetic field for each area of an element in the magnetic substrate, when magnetization of each area changes and based on a magnetic field generated from magnetic energy in each area and a rate of change of magnetization working in a direction inhibiting change in the average magnetization of the areas; obtaining for each area and based on the calculated effective magnetic fields and magnetization of each area, changes in magnetization and calculating for each area, magnetization after the changes; judging based on magnetization of each area before and after the changes, whether magnetization in the element converges; and storing a combination of the average magnetization of the areas for which magnetization in the given element converges and a static magnetic field based on the average magnetization.

Simulation apparatus and simulation method

A temperature measurement system including a measurement plate placed on a measurement plane specified on at least one of an intake opening and an exhaust opening of a rack storing an information processing apparatus or at a position being away from the measurement plane by a predetermined distance; and an infrared camera configured to capture an image of the measurement plate, where the infrared camera is placed at a position with which the measurement plane is not captured and the measurement plate is captured by the infrared camera.

Temperature measurement system and temperature measurement method

A magnet unit for a magnetron sputtering system includes a base plate and a plurality of magnet parts each including a first magnet and a first supporting member. The first supporting member supports the first magnet and fixes the first magnet to the base plate. The magnet parts confine a plasma.

Magnet unit for magnetron sputtering system

The simulation apparatus includes mesh dividing section, process condition setting section, boundary surface simulating section for simulating a change in a shape of a boundary surface of the structure which change is caused from the process using the calculation condition set by the process condition setting section, level value determining section for determining level values each of which concerns a distance between one of the nodes and the boundary surface, and level value data retaining section for retaining, for each of the nodes, the level value in association with the boundary surface. The simulation apparatus makes it possible to express a number of materials being smaller in size than the mesh element. Consequently, the mesh element size can be set larger to improve the memory consumption amount and the calculation speed.

Simulation apparatus, simulation method, and computer-readable recording medium in which simulation program is stored

A simulation environment establishment unit constructs a three-dimensional virtual space for a simulation, where a plurality of lattice points is orthogonally arranged as well as ensures in a storage step a storage region storing information for each of the plurality of lattice points. A surface shape processing unit sequentially grows and changes a material surface shape in the three-dimensional virtual space in accordance with manufacturing process conditions, calculates a level value representing a distance from the material surface for each lattice point, and stores the level value into a storage region of a corresponding lattice point to represent the surface shape. A material inside information processing unit calculates material inside information within the material when the surface passes through a lattice point due to the growth and change in the material and stores the material inside information into a storage region of a corresponding lattice point.

Shape simulation method, program and apparatus

A matrix computing unit evaluates visual properties influenced by a positional relationship between surface elements of an element so that a shading effect and a re-deposition effect are reflected to the simulation results. A beam condition computing unit calculates beam conditions according to a position of the element on a wafer so that a difference in machined topologies caused by a positional difference on the wafer is reflected to the simulation results.

Growing community of inventors

Kawasaki, Japan

Atsushi Furuya