Kabushiki Kaisha Toshiba

Nuflare Technology, Inc.

Matsushita Electric Industrial Co., Ltd.

Nippon Telegraph and Telephone Corporation

Panasonic Corporation

Tokyo Electron Limited

Nuflare Technology America, Inc.

L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

Dainippon Screen Mfg. Co., Ltd.

Atsushi Ando

Kazuyoshi Sugihara

Hosana Kamiyama

Satoshi Kobashikawa

Katsuya Okumura

Munehiro Ogasawara

Hisashi Takayama

Tetsuro Nakasugi

Kazuhiko Inoue

Osamu Sasaki

Kyoko Kawaguchi

Shunko Magoshi

Yoshiaki Nakanishi

Tsutomu Uenoyama

Daisaku Komiya

Osamu Nagano

Kazunori Yamada

John Hartley

Shinji Sato

Masao Ito

Yuichiro Yamazaki

Nobutaka Kikuiri

Koichi Ishii

Ryoichi Inanami

Yumi Watanabe

Yuji Kanno

Toru Shibata

Takahiro Murata

Hiromi Niiyama

Kazuaki Kurachi

Yosimitu Kato

Ken Tsurubayashi

Osamu Iwasaki

Susumu Hashimoto

Yoshihiko Nakano

Riki Ogawa

Katsuhide Watanabe

Motosuke Miyoshi

Yasunobu Onishi

Hiroaki Yoshio

Shuji Hayase

Kippei Sugita

Shuji Moriya

Toshio Oka

Kiyoshi Hattori

Yoshihiro Hayakawa

Yasuhiko Sato

Hirotsugu Wada

Akino Inoue

Toshimasa Takaki

Yoshikazu Ichioka

Harunari Hasegawa

Rikako Kani

Kazuhiro Nakai

Hitoshi Sunaoshi

Jun Sonobe

Yoshiki Fukuhara

Noboru Tamura

Makoto Takahashi

Christopher Turpin

Ryouichi Inanami

Yuichi Maekawa

Paralinguistic information is estimated with high accuracy even when an utterance for which it is difficult to identify paralinguistic information is used for model learning. An acoustic feature extraction unitextracts an acoustic feature from an utterance. An anti-teacher decision unitdecides, based on a paralinguistic information label indicating a determination result of paralinguistic information given by a plurality of listeners for each utterance, an anti-teacher label indicating an anti-teacher serving as incorrect paralinguistic information for the utterance. An anti-teacher estimation model learning unitlearns, based on an acoustic feature extracted from the utterance and the anti-teacher label, an anti-teacher estimation model for outputting a posterior probability of anti-teacher for an input acoustic feature.

Paralinguistic information estimation model learning apparatus, paralinguistic information estimation apparatus, and program

A multiple secondary electron beam alignment method includes scanning a plurality of first detection elements of a multi-detector, which are arrayed in a grid, with multiple secondary electron beams emitted from a surface of a target object on a stage, detecting a plurality of beams including a corner beam located at a corner in the multiple secondary electron beams by the multi-detector, calculating a positional relationship between the plurality of beams including the corner beam and a plurality of second detection elements, which have detected the plurality of beams including the corner beam, in the plurality of first detection elements, calculating, based on the positional relationship, a shift amount for aligning the plurality of first detection elements with the multiple secondary electron beams, and moving, using the shift amount, the multi-detector relatively to the multiple secondary electron beams.

Multiple secondary electron beam alignment method, multiple secondary electron beam alignment apparatus, and electron beam inspection apparatus

A multi-electron beam inspection apparatus includes first sample hold circuits, each configured to include a capacitor and a switch arranged for each of electrodes of each of a plurality of multipoles, and to hold, using the capacitor and the switch, a potential to be applied to the each of the electrodes, power sources configured to apply potentials to the plurality of first sample hold circuits, a control circuit configured to control the plurality of first sample hold circuits such that the plurality of potentials having been applied to the plurality of first sample hold circuits are held, in synchronization with swinging back of the collective beam deflection by the objective deflector, by a plurality of second sample hold circuits selected from the plurality of first sample hold circuits, and a detector configured to detect multiple secondary electron beams emitted because the substrate is irradiated with the multiple primary electron beams.

Multi-electron beam inspection apparatus, multipole array control method, and multi-electron beam inspection method

In one embodiment, an electron beam inspection apparatus includes an optical system irradiating a substrate with primary electron beams, a beam separator separating, from the primary electron beams, secondary electron beams emitted as a result of irradiating the substrate with the primary electron beams, a detector detecting the secondary electron beams separated, a movable stage on which the substrate is placed, a support base supporting the substrate on the stage, and an applying unit applying a first voltage to the substrate. The support base includes a plurality of support pins that support the substrate from below. The support pins each include a columnar insulator and a metal film disposed in the insulator. A second voltage is applied to the metal film.

Electron beam inspection apparatus

A conduction inspection method for a multipole aberration corrector according to one aspect of the present invention includes applying, in a state where a predetermined potential has been applied to each shield electrode, an inspection charged particle beam to pass through a first opening, a second opening, and a third opening, using a multipole aberration corrector which includes an upper-stage substrate where the first opening is formed and a shield electrode is arranged around the first opening, a middle-stage substrate where the second opening is formed, a plurality of control electrodes are disposed to be opposite each other across the second opening, and a plurality of wirings are arranged to be individually connected to one of the plurality of control electrodes which are different from each other, and a lower-stage substrate where the third opening is formed and a shield electrode is arranged around the third opening, and which corrects aberration of a correction charged particle beam passing through the first opening, the second opening, and the third opening by individually variably applying a potential to each of the plurality of control electrodes; measuring, via a wiring individually connected to each control electrode of the plurality of control electrodes in the plurality of wirings, an inflow electron dose of electrons, into each control electrode of the plurality of control electrodes, which are secondarily emitted because the inspection charged particle beam has passed through the first opening, the second opening, and the third opening and has irradiated an object disposed at the downstream side of the lower-stage substrate; and determining individually, for each control electrode, whether there is conduction between a control electrode concerned and a wiring connected to the control electrode concerned, based on a result of measuring the inflow electron dose into each control electrode.

Conduction inspection method for multipole aberration corrector, and conduction inspection apparatus for multipole aberration corrector

To increase the accuracy of paralinguistic information estimation. A paralinguistic information estimation model storage unitstores a paralinguistic information estimation model outputting, with a plurality of independent features as inputs, paralinguistic information estimation results. A feature extraction unitextracts the features from an input utterance. A paralinguistic information estimation unitestimates paralinguistic information of the input utterance from the features extracted from the input utterance, by using the paralinguistic information estimation model. The paralinguistic information estimation model includes, for each of the features, a feature sub-model outputting information to be used for estimation of paralinguistic information, based only on the feature, for each of the features, a feature weight calculation unit calculating a feature weight, based on an output result of the feature sub-model, for each of the features, a feature gate weighting the output result from the feature sub-model with the feature weight and outputting a result, and a result integration sub-model estimating the paralinguistic information, based on output results from all the feature gates.

Paralinguistic information estimation apparatus, paralinguistic information estimation method, and program

An attribute identification technology that can reject an attribute identification result if the reliability thereof is low is provided. An attribute identification device includes: a posteriori probability calculation unitthat calculates, from input speech, a posteriori probability sequence {q(c, i)} which is a sequence of the posteriori probabilities q(c, i) that a frame i of the input speech is a class c; a reliability calculation unitthat calculates, from the posteriori probability sequence {q(c, i)}, reliability r(c) indicating the extent to which the class c is a correct attribute identification result; and an attribute identification result generating unitthat generates an attribute identification result L of the input speech from the posteriori probability sequence {q(c, i)} and the reliability r(c). The attribute identification result generating unitobtains a most probable estimated class c{circumflex over (&#x2003;)}, which is a class that is estimated to be the most probable attribute, from the posteriori probability sequence {q(c, i)} and sets &#x3d5; indicating rejection as the attribute identification result L if the reliability r(c{circumflex over (&#x2003;)}) of the most probable estimated class c{circumflex over (&#x2003;)} falls within a predetermined range indicating that the reliability r(c{circumflex over (&#x2003;)}) is low and sets the most probable estimated class c{circumflex over (&#x2003;)} as the attribute identification result L otherwise.

Attribute identification method, and program

According to one aspect of the present invention, a multi-beam image acquisition apparatus, includes: an objective lens configured to image multiple primary electron beams on a substrate by using the multiple primary electron beams; a separator configured to have two or more electrodes for forming an electric field and two or more magnetic poles for forming a magnetic field and configured to separate multiple secondary electron beams emitted due to the substrate being irradiated with the multiple primary electron beams from trajectories of the multiple primary electron beams by the electric field and the magnetic field formed; a deflector configured to deflect the multiple secondary electron beams separated; a lens arranged between the objective lens and the deflector and configured to image the multiple secondary electron beams at a deflection point of the deflector; and a detector configured to detect the deflected multiple secondary electron beams.

Multi-beam image acquisition apparatus and multi-beam image acquisition method

Estimation accuracies of a conversation satisfaction and a speech satisfaction are improved. A learning data storage unit () stores learning data including a conversation voice containing a conversation including a plurality of speeches, a correct answer value of a conversation satisfaction for the conversation, and a correct answer value of a speech satisfaction for each speech included in the conversation. A model learning unit () learns a satisfaction estimation model using a feature quantity of each speech extracted from the conversation voice, the correct answer value of the speech satisfaction, and the correct answer value of the conversation satisfaction, the satisfaction estimation model configured by connecting a speech satisfaction estimation model part that receives a feature quantity of each speech and estimates the speech satisfaction of each speech with a conversation satisfaction estimation model part that receives at least the speech satisfaction of each speech and estimates the conversation satisfaction.

Satisfaction estimation model learning apparatus, satisfaction estimating apparatus, satisfaction estimation model learning method, satisfaction estimation method, and program

With correct emotion classes selected as correct values of an emotion of an utterer of a first utterance from among a plurality of emotion classes C, . . . , Cby listeners who have listened to the first utterance, as an input, the numbers of times nthat emotion classes Chave been selected as the correct emotion classes are obtained, and rates of the numbers of times nto a sum total of the numbers of times n, . . . , nor smoothed values of the rates are obtained as correct emotion soft labels tcorresponding to the first utterance.

Label generation device, model learning device, emotion recognition apparatus, methods therefor, program, and recording medium

State-of-satisfaction change pattern models each including a set of transition weights in state sequences of the states of satisfaction are obtained for predetermined change patterns of the states of satisfaction, and a state-of-satisfaction estimation model for obtaining the posteriori probability of the utterance feature amount given the state of satisfaction of an utterer is obtained by using the utterance-for-learning feature amount and a correct value of the state of satisfaction of an utterer who gave an utterance for learning corresponding to the utterance-for-learning feature amount. By using the input utterance feature amount and the state-of-satisfaction change pattern models and the state-of-satisfaction estimation model, an estimated value of the state of satisfaction of an utterer who gave an utterance corresponding to the input utterance feature amount is obtained.

Model learning device, estimating device, methods therefor, and program

An urgency level estimation technique of estimating an urgency level of a speaker for free uttered speech, which does not require a specific word, is provided. An urgency level estimation apparatus includes a feature amount extracting part configured to extract a feature amount of an utterance from uttered speech, and an urgency level estimating part configured to estimate an urgency level of a speaker of the uttered speech from the feature amount based on a relationship between a feature amount extracted from uttered speech and an urgency level of a speaker of the uttered speech, the relationship being determined in advance, and the feature amount includes at least one of a feature indicating speaking speed of the uttered speech, a feature indicating voice pitch of the uttered speech and a feature indicating a power level of the uttered speech.

Urgency level estimation apparatus, urgency level estimation method, and program

An electron beam inspection apparatus includes a plurality of electrodes to surround an inspection substrate placed on a stage, a camera to measure, for each of the plurality of electrodes, a gap between a peripheral edge of the inspection substrate and an electrode of the plurality of electrodes, a retarding potential application circuit to apply a retarding potential to the inspection substrate, an electrode potential application circuit to apply, to each electrode, a corresponding potential of potentials each obtained by adding an offset potential, which is variable according to a measured gap, to the retarding potential to be applied to the inspection substrate, and an electron optical system to irradiate the inspection substrate with electron beams, in the state where the retarding potential has been applied to the inspection substrate and the corresponding potential of the potentials has been individually applied to each of the plurality of electrodes.

Electron beam inspection apparatus and electron beam inspection method

A multiple electron beam irradiation apparatus includes a shaping aperture array substrate to form multiple primary electron beams, a plurality of electrode array substrates stacked each to dispose thereon a plurality of electrodes each arranged at a passage position of each of the multiple primary electron beams, each of the multiple primary electron beams surrounded by an electrode of the plurality of electrodes when each of the multiple primary electron beams passes through the passage position, the first wiring and the second wiring applied with one of different electric potentials, and a stage to mount thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode array substrates, wherein, in each of the plurality of electrode array substrates, each of the plurality of electrodes is electrically connected to either one of the first wiring and the second wiring.

Multiple electron beams irradiation apparatus

A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.

Growing community of inventors

Tokyo, Japan

Atsushi Ando