Horiba Stec, Co., Ltd.

Atsuko Teraoka

Masakazu Minami

Kotaro Takijiri

Yuhei Sakaguchi

Daisuke Hayashi

Hiroshi Nishizato

A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.

Gas control system and program for gas control system

The present invention intends to provide a CpMg concentration measuring device capable of accurately measuring the concentration of CpMg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 &#x3bc;m and on the basis of the light intensity, calculate the concentration of CpMg in a material gas.

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Kyoto, Japan

Atsuko Teraoka