National Institute of Advanced Industrial Science and Technology

Mitsui Chemicals, Inc.

Atsuko Sekiguchi

Atsushi Okubo

Kazuo Kohmura

Takeo Yamada

Yuichi Kato

Kenji Hata

Yosuke Ono

Hisako Ishikawa

Ying Zhou

Ryohei Ogawa

Yousuke Ono

A pellicle film for photolithography including a carbon nanotube film, in which the carbon nanotube film contains carbon nanotubes; the carbon nanotube film transmits 80% or more of EUV light at a wavelength of 13.5 nm; the carbon nanotube film has a thickness from 1 nm to 50 nm; the carbon nanotube film is deposited on a silicon substrate, in which the 3σ of the reflectance is 15% or less when the reflectance of the deposited carbon nanotube film is measured using a reflectance spectrophotometer-based film thickness meter under the following conditions: the diameter of measurement spots, 20 μm; the reference measurement wavelength, 285 nm; the number of measurement spots, 121 spots; the distance between the centers of adjacent measurement spots, 40 μm.

Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography

Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.

Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device

Provided are: an elastomer structure containing carbon nanotubes; and a method for producing the elastomer structure. In a CNT elastomer having a mesh shaped carbon nanotube aggregate on a surface layer thereof, the mesh shaped carbon nanotube aggregate can impart a shape-retaining property to the elastomer. Therefore, the elastomer can be molded along the shape of a mold, and it becomes possible to mold a carbon nanotube elastomer having a fine dimension. The elastomer structure containing carbon nanotubes according to the present invention is provided with mesh shaped carbon nanotube aggregate which are embedded in a surface layer of the elastomer structure containing carbon nanotubes and are not protruded from the surface of the elastomer structure containing carbon nanotubes.

Elastomer structure containing carbon nanotubes and method for producing the same

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Tsukuba, Japan

Atsuko Sekiguchi