Lintec Corporation

Atsuko Kimura

Toshio Sugizaki

Osamu Moriya

Toshifumi Kageyama

Taketo Kumon

The present invention provides a process for producing a polysilsesquioxane graft polymer (1) which includes applying ionizing radiation or heat to a mixture including a polysilsesquioxane compound (2) and a vinyl compound (3), a polysilsesquioxane compound including an iniferter group, and a pressure-sensitive adhesive and a pressure-sensitive adhesive sheet using the polymer. According to the present invention, a process for producing a polysilsesquioxane graft polymer which may be used as a pressure-sensitive adhesive exhibiting excellent heat resistance and cohesive force, and the like are provided. In the formula, A represents a linking group, Rrepresents a hydrocarbon group which may have a substituent, Rrepresents a hydrogen atom or the like, Rrepresents a polar group or the like, Rrepresents a hydrogen atom or the like, kto krepresent arbitrary positive integers, 1 to n represent zero or an arbitrary positive integer (excluding the case where 'm=n=0'), and Q represents an iniferter group.

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Tokyo, Japan

Atsuko Kimura