Olympus Corporation

Atsuhiko Kasahi

Kenji Noda

Takefumi Uesugi

Daisuke Sano

Takehiro Nishiie

Mutsumi Ohshima

Yoshimine Kobayashi

Masashi Umemura

A gas supply system appropriate for an abdominal cavity and a luminal cavity is provided. The gas supply system reduces a pressure of gas, supplied from a source of gas for supplying gas of a predetermined kind, to a predetermined pressure value upon which gas, whose pressure is reduced, is controllably lowered to a first pressure value appropriate for a body cavity of a first kind of a specimen to allow gas to be supplied to the body cavity of the first kind. In the meantime, gas, supplied from the source of gas, is lowered to a second pressure value appropriate for a body cavity of a second kind of the specimen to allow gas to be supplied to the body cavity of the second kind.

System and method for supplying predetermined gas at two different pressure values

In a gas supply system, a controller is electrically connected to a pressure regulator and an operation switch. The controller is operative to control the pressure regulator so that a predetermined gas is supplied to a first delivery member directing to a first body cavity with its pressure regulated to a first pressure suitable for the first body cavity. The controller is operative to control the pressure regulator depending on an instruction sent from the operation switch upon operation of the operator so that the predetermined gas is supplied to a second delivery member directing to a second body cavity with its pressure regulated to a second pressure suitable for the second body cavity.

Method and system for supplying predetermined gas into body cavities of a specimen

An endoscopic system includes an endoscope having a delivery member available to supply a body cavity of a specimen and, in addition thereto, a gas supply apparatus from which predetermined gas is supplied to a body cavity via a delivery member. The endoscopic system further includes a determination unit that determines whether or not there is a status in which, the gas supply device needs to supply gas to the body cavity, and a control unit that selectively and automatically control a permit and stop for the gas supply to be implemented by the gas supply apparatus depending on a determined result of the determination unit, which are formed in a unitary structure with, for instance, the gas supply unit.

Endoscopic system equipped with gas supply apparatus

A gas supply apparatus measures a first pressure inside a first body cavity of a patient and a second pressure inside a second body cavity of the patient. The gas supply apparatus regulates a pressure of a predetermined gas based on the measured first and second pressures inside the first and second body cavities.

Method and apparatus for supplying predetermined gas into body cavities of a patient

A gas supply apparatus measures a first pressure inside a first body cavity of a specimen and a second pressure inside a second body cavity of the specimen. The gas supply apparatus regulates a pressure of a predetermined gas based on the measured first and second pressures inside the first and second body cavities so that the first and second pressures reach predetermined first and second pressure settings, respectively.

A gas supply apparatus is provided and has first and second fittings and first and second tubes. The first fitting is provided to discharge a gas of a first pressure therethrough, while the second fitting is provided to discharge a gas of a second pressure therethrough. The first tube has one end to which a first connector connectable to the first fitting is attached and supplies the first-pressure gas to a first body cavity of a subject. The second tube has one end to which a second connector connectable to the second fitting is attached and supplies the second-pressure gas to a second body cavity of the subject. The apparatus may comprise an erroneous-connection preventing device preventing an erroneous connection including at least one of a connection of the first connector to the second fitting and a further connection of the second connector to the first fitting.

Apparatus for supplying gas at two different pressures

In a gas supply system, a selection unit is configured to send an instruction to select any one of first gas and second gas. In the gas supply system, a controller is operative to control at least one of a first gas supply unit for supplying the first gas and a second gas supply unit for supplying the second gas to selectively insufflate any one of the first gas and second gas into a body based on the instruction sent from the selection unit.

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Yokohama, Japan

Atsuhiko Kasahi