Trimedia Corporation

Xidex Corporation

Atef Eltoukhy

Rick C Price

A method of producing a thin-film magnetic disk having high coercivity and magnetic remanence, good loop squareness, and low fluctuation in peak-to-peak recording signal amplitude over an entire circular recording path. The novel aspects of the method which contribute to the performance characteristics of the disk are (a) layering a 300-1,000 .ANG. magnetic film containing between about 70-88% cobalt, 10-28% nickel, and 2-12% chromium over a 1,000-4,000 .ANG. chromium underlayer; (b) forming the film and underlayer under sputtering disposition conditions which prevent low-angle asymmetrical sputtering; and (c) shielding the disk substrate during sputtering in a manner which produces substantially uniform-thickness deposition.

Method of producing thin-film storage disk

A rapid-load system for loading a series of pallets into a sputtering apparatus. The system comprises a magazine having a plurality of vertically spaced pallet supports whose spacing is sufficient to allow insertion of a pallet into the magazine directly without contact between the pallet and magazine. The magazine is removably supported in a load-in chamber of the sputtering apparatus by a chamber track assembly. A movable loading cart in the system includes a shiftable carriage for moving a pallet supported on the carriage between loading and stacking positions, and a magazine track assembly on which the magazine can be vertically shifted to each of a series of insertion positions, at which a pallet can be moved on the carriage into a position between vertically adjacent magazine supports, without contact between the pallet and supports, and corresponding release positions, at which weight support for the pallet is transferred from the carriage to the magazine transfer track assembly for transferring the magazine from the support track assembly on the cart to the chamber track assembly within the load-in chamber with the cart position adjacent the load-in chamber.

Pallet-loading system

A baffle for use in achieving a substantially isotropic grain structure in a crystalline layer which is sputtered onto a substrate by moving the substrate linearly, and without rotation, in a front-to-back direction below a sputtering target. The baffle has front and back shields which are adapted to limit deposition of sputtered material onto the moving substrate substantially to substrate regions which directly underlie the target. A pair of strips in the baffle are constructed to effect substantially symmetrical sputtering of material onto the substrate surface from opposite target side directions, to produce an isotropic crystal structure during early phases of film deposition.

Growing community of inventors

San Jose, CA, United States of America

Atef Eltoukhy