Bruker Axs Gmbh

Assunta Vigliante

Joachim Lange

Rolf Schipper

Lutz Brügemann

Ekkehard Gerndt

An XRF (XRF=x-ray fluorescence) measurement apparatus () has an x-ray source () for generating x-rays (), x-ray optics () for directing x-rays () from the x-ray source () to a sample () and an EDS (EDS=energy dispersive spectroscopy) detector () for detecting fluorescent x-rays () from the sample (). The apparatus is characterized in that the sample () is a wafer (), in particular a Si wafer, wherein the x-ray optics () is positioned to direct the x-rays () onto the bevel () of the wafer (). The x-ray source () plus the x-ray optics () has a brilliance of at least 5*10counts/sec mm, preferably at least 1*10counts/sec mm. The apparatus allows an improved contamination control of wafers, in particular silicon wafers.

XRF measurement apparatus for detecting contaminations on the bevel of a wafer

An X-ray diffractometer () comprising an X-ray source () emitting a line focus X-ray beam () wherein the larger extension of the beam cross section defines a line direction () of the X-ray beam (), further comprising a sample (), and an X-ray detector () rotatable in a scattering plane around an axis &#x3c9; intersecting the position of the sample () is characterized in that the X-ray source is mounted to a switching device (), which allows to move the X-ray source into one of two fixed positions with respect to the scattering plane, wherein in the first position the line direction () of the X-ray beam () is parallel to the scattering plane and in the second position the line direction () of the X-ray beam () is perpendicular to the scattering plane, and wherein the path of the X-ray beam () in the two fixed positions of the X-ray source is the same. This X-ray diffractometer has a simple mechanical setup and allows in plane grazing incidence diffraction as well as regular XRD measurements with good resolution.

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Stuttgart, Germany

Assunta Vigliante