Hexion Inc.

Momentive Specialty Chemicals Inc.

Bakelite UK Holding Ltd.

Ashok T Reddy

Justyne Marie Willman

Craig Zirkle

Joseph E Wentworth

Compositions, methods, and resins using alkyl aldehydes and phenols are provided herein. In one embodiment, a composition comprising an alkylphenol resin can be prepared by condensing at least one phenolic monomer selected from the group consisting of phenol, cresol, resorcinol, xylenol, ethyl phenol, alkylresorcinols, and combinations thereof; and at least one alkyl aldehyde having from 5 to 12 carbon atom alkyl groups. The alkylphenol resins of the application are free of octylphenol or nonylphenol monomers. In one embodiment, the alkylphenol resins may be prepared using formaldehyde, and alternatively, in another embodiment, the alkylphenol resins may be prepared without the use of formaldehyde. The process to make these new alternative alkylphenol resins is a cost effective process and easy to scale-up.

Alkylphenol resins and a method of preparing thereof

A composition comprising, a rubber component selected from the group consisting of a rubber polymer, a synthetic rubber polymer, and combinations thereof; and an alkylphenol resin which is a reaction product of: at least one phenolic monomer selected from the group consisting of phenol, cresol, resorcinol, xylenol, ethyl phenol, alkylresorcinols, and combinations thereof; and at least one alkyl aldehyde having from 5 to 12 carbon atom alkyl groups, is disclosed. The composition can be used to prepare articles of manufacture such as tires, tire treads, tire shoulders, tire sidewalls, rubber belts, and rubber hoses.

Rubber compositions containing tackifiers

Polymeric materials, methods for making the polymeric materials, and photoresist formulations utilizing the polymeric materials are disclosed. In one aspect, a polymeric material is provided including a condensation product of a reaction mixture comprising an aldehyde with a phenolic monomer composition comprising m-cresol, p-cresol, 3,5-dimethyl phenol, and 2,5-dimethyl phenol. The polymeric material may be further contacted with a photoactive compound and a solvent to form a photoresist formulation.

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Louisville, KY, United States of America

Ashok T Reddy