Asml Netherlands B.v.

Aschwin Lodewijk Hendricus Johannes Van Meer

Joost Jeroen Ottens

Jeroen Johannes Sophia Maria Mertens

Patricius Aloysius Jacobus Tinnemans

Marco Koert Stavenga

Koen Jacobus Johannes Maria Zaal

Theodorus Petrus Maria Cadee

Boris Menchtchikov

Stoyan Nihtianov

Koen Goorman

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Erik Roelof Loopstra

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Michel Riepen

Martinus Cornelis Maria Verhagen

Franciscus Johannes Joseph Janssen

Jacobus Johannus Leonardus Hendricus Verspay

Tjarko Adriaan Rudolf Van Empel

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Herman Boom

Frederik Eduard De Jong

Christianus Gerardus Maria De Mol

Richard Moerman

Marcel Johannus Elisabeth Hubertus Muitjens

Maria Elisabeth Reuhman-Huisken

Sjoerd Nicolaas Lambertus Donders

Franciscus Andreas Cornelis Johannes Spanjers

Jan Rein Miedema

Arno Jan Bleeker

Wim Tjibbo Tel

Johannes Petrus Martinus Bernardus Vermeulen

Edwin Johan Buis

Gert-Jan Heerens

Rene Theodorus Petrus Compen

Jan Frederik Hoogkamp

Raimond Visser

Henricus Gerardus Tegenbosch

Thomas Josephus Maria Castenmiller

Jan Van Elp

Patrick Johannes Cornelus Hendrik Smulders

Edwin Van Gompel

Jacob Willem Vink

Johannes Charles Adrianus Van Den Berg

Henricus Johannes Adrianus Van De Sande

Frederick Eduard De Jong

Petrus Johannes Gerrits

Thijs Vervoort

Ton Aantjes

Jacobus Johannus Leonardus Hendricus Verspaij

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.

Lithographic apparatus and device manufacturing method

The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.

Lithographic apparatus

An apparatus includes a support table for supporting a substrate. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.

Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

Lithographic support structure

A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

Lithographic apparatus and method of a manufacturing device

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.

Lithographic apparatus, article support member, and method

A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.

Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby

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Roosendaal, Netherlands

Aschwin Lodewijk Hendricus Johannes Van Meer