Emc IP Holding Company LLC

Lam Research Corporation

Novellus Systems Incorporated

Arun Keshavamurthy

David Cohen

Richard M Blank

Ronald Allan Powell

Mahesh Kamat

Shuang Liang

Akshay Narayan Muramatti

Mukul Khosla

Bart K Van Schravendijk

Jayasekhar Konduru

A method for upgrading a file system in a data storage environment is provided. A storage system identifies a set of boundaries of one or more sets of hard disks based on a first block management data structure (BMDS), where the first BMDS includes information describing a storage volume representing the one or more sets of hard disks. For each identified boundary, the storage system identifies a data block range of a set of data blocks, where the data block range includes metadata of one set of hard disks that is stored on the set of data blocks. Further, the storage system concurrently generates a plurality of second BMDSs, each of the second BMDS corresponding to one of the sets of hard disks, including simultaneously retrieving metadata of the sets of hard disks, where the second BMDSs are constructed based on the retrieved metadata, representing an upgraded file system.

Method for parallel file system upgrade in virtual storage environment

A semiconductor substrate processing apparatus for processing semiconductor substrates includes showerhead module delivering process gas through a faceplate having gas passages therethrough from the process gas source to a processing zone of the processing apparatus wherein individual semiconductor substrates are processed. The showerhead module comprises a gas delivery conduit in fluid communication with a cavity at a lower end thereof, a baffle arrangement in the gas delivery conduit and the cavity, and a blocker plate in the cavity disposed below the baffle arrangement. The baffle arrangement comprises baffles which divide process gas flowing through the gas delivery conduit into center, inner annular, and outer annular flow streams. The center flow stream exits the baffle arrangement above a central portion of the faceplate, the inner annular flow stream exits the baffle arrangement above an inner annular region of the faceplate, and the outer annular flow stream exits the baffle arrangement above an outer annular region of the faceplate.

Semiconductor substrate processing apparatus including uniformity baffles

A substrate handling robot includes an arm section and a wrist portion connected to the arm section. An end effector is connected to the wrist portion and is configured to support a substrate. A housing is arranged adjacent to the end effector and includes a gas outlet that directs gas onto an exposed surface of the substrate during transport.

Systems and methods for inhibiting oxide growth in substrate handler vacuum chambers

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Bengaluru, India

Arun Keshavamurthy