Asml Netherlands B.v.

Artunç Ulucan

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Han Henricus Aldegonda Lempens

Ruud Olieslagers

Miao Yu

Johannes Cornelis Paulus Melman

Patrick Johannes Wilhelmus Spruytenburg

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Artunç Ulucan