Silecs Oy

Arto L T Maaninen

Jarkko J Pietikainen

Juha T Rantala

Tiina Maaninen

T Teemu T Tormanen

Juha A Rantala

Jason S Reid

Nungavram S Viswanathan

Tina J Maaninen

Nungavaram Sundaram Viswanathan

Teemu Tormanen

Waveguides are disclosed (and other devices and materials including but not limited to hybrid organic-inorganic coatings, passivation materials, glob top materials, underfill materials, materials for IC and other applications, microlenses and any of a wide variety of optical devices) that benefit by being formed of a novel hybrid organic-inorganic material. In one embodiment of the invention, a method for making a waveguide includes: forming a lower cladding layer on a substrate; forming a core layer after the lower cladding layer; and forming an upper cladding layer after the core layer; wherein the lower cladding layer, core layer and/or upper cladding layer comprises a hybrid organic-inorganic material&#x2014;that has many desirable properties relating to stability, hydrophobicity, roughness, optical absorbance, polarization dependent loss, among others.

Hybrid organic-inorganic materials for waveguides, optical devices, and other applications

A method for making an integrated circuit is disclosed as comprising depositing alternating regions of electrically conductive and dielectric materials on a substrate, wherein an area of dielectric material is formed by: a silane precursor having a fully or partially fluorinated first organic group comprising an unsaturated carbon-carbon double bond, the fully or partially fluorinated organic group bound to silicon in the silane precursor; forming from the silane precursor a hybrid organic-inorganic material having a molecular weight of at least 500 on a substrate; and increasing the molecular weight of the hybrid material by exposure to heat, electromagnetic radiation or electron beam so as to break the unsaturated carbon-carbon double bond and cross link via the fully or partially fluorinated organic group. Also disclosed is a method for making an integrated circuit is disclosed as comprising: reacting a compound of the general formula X3MOR3, where X3 is a halogen, M is silicon, and OR3 is alkoxy; with a compound of the general formula R1M1; where R1 is selected from alkyl, alkenyl, aryl and alkynyl and wherein R1 is partially or fully fluorinated; and M1 is an element from group I of the periodic table; so as to form a compound of the general formula R1MOR3; hydrolyzing and condensing R1MOR3so as to form a hybrid organic-inorganic material with a molecular weight of at least 500; depositing the hybrid organic-inorganic material on a substrate as an insulator in an integrated circuit; depositing, before or after depositing the hybrid material, an electrically conductive material within the integrated circuit.

Poly(organosiloxane) materials and methods for hybrid organic-inorganic dielectrics for integrated circuit applications

A compound of the general formula RMRRRis provided where Ris a partially or fully fluorinated aryl, alkyl, alkenyl or alkynyl group, wherein M is selected from group 14 of the periodic table, wherein R, Rand Rare independently an alkoxy group ORor a halogen group X&#x2014;except, a) where R, Rand Rare each ethoxy, M is Si and Ris perfluorinated phenyl or perfluorinated vinyl; b) where Ris ethoxy, Rand Rare chlorine, M is Si, and Ris perfluorinated phenyl; or c) where R, Rand Rare chlorine, M is Si, and Ris perfluorinated phenyl, perfluorinated methyl or perfluorinated vinyl. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed, alone or with one or more similar compounds, to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making compounds of the general formula RMRRRare also disclosed.

Methods and compounds for making coatings, waveguides and other optical devices

A method for making an integrated circuit is disclosed as comprising depositing alternating regions of electrically conductive and dielectric materials on a substrate, wherein an area of dielectric material is formed by: a silane precursor having a fully or partially fluorinated first organic group comprising an unsaturated carbon-carbon double bond, the fully or partially fluorinated organic group bound to silicon in the silane precursor; forming from the silane precursor a hybrid organic-inorganic material having a molecular weight of at least 500 on a substrate; and increasing the molecular weight of the hybrid material by exposure to heat, electromagnetic radiation or electron beam so as to break the unsaturated carbon-carbon double bond and cross link via the fully or partially fluorinated organic group. Also disclosed is a method for making an integrated circuit is disclosed as comprising: reacting a compound of the general formula X3MOR3, where X3 is a halogen, M is silicon, and OR3 is alkoxy; with a compound of the general formula R1M1; where R1 is selected from alkyl, alkenyl, aryl and alkynyl and wherein R1 is partially or fully fluorinated; and M1 is an element from group I of the periodic table; so as to form a compound of the general formula R1MOR3; hydrolyzing and condensing R1MOR3so as to form a hybrid organic-inorganic material with a molecular weight of at least 500; depositing the hybrid organic-inorganic material on a substrate as an insulator in an integrated circuit; depositing, before or after depositing the hybrid material, an electrically conductive material within the integrated circuit. Also disclosed is a method for making an integrated circuit comprising forming alternating areas of electrically conductive and dielectric materials, the dielectric materials formed by hydrolysing, partially or fully, one or more precursors, at least one of which having the formula (I): where R2 is a halogen, &#x2014;OH, or alkoxy group, where M1 and M2 are independently a metal or metalloid, and where R1 is a fully or partially fluorinated alkyl group having from 1 to 10 carbon atoms or a fully or partially fluorinated aromatic group.

A compound of the general formula: RRRMR, wherein R, Rand Rare independently an aryl, alkyl, alkenyl or alkynyl group, wherein at least one of R, Rand Ris fully or partially fluorinated, wherein M is selected from group 14 of the periodic table, and wherein Ris either an alkoxy group, OR, or a halogen group, X. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed with one or more similar compounds (preferably having one or two R groups bound to M), to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making and using compounds of the general formula RRRMRare also disclosed.

Waveguides are disclosed (and other devices and materials including but not limited to hydrophobic coatings, passivation materials, glob top materials, underfill materials, dielectric materials for IC and other applications, microlenses and any of a wide variety of optical devices) that benefit by a high hydrophobicity and high stability and, among other things. In one embodiment of the invention, a method for making a waveguide comprises: forming a lower cladding layer on a substrate; forming a core layer after the lower cladding layer; and forming an upper cladding layer after the core layer; wherein the lower cladding layer, core layer and/or upper cladding layer is hydrophobic and results, if exposed to water, in a water contact angle of 90 degrees or more.

Hydrophobic materials for waveguides, optical devices, and other applications

A compound of the general formula RRMRRis disclosed wherein Rand Rare independently an aryl, alkyl, alkenyl, epoxy or alkynyl group, wherein at least one of Rand Ris fully or partially fluorinated, wherein M is selected from group 14 of the periodic table, wherein Rand Rare independently an alkoxy group, OR, or a halogen group, X, except where M is Si, Rand Rare both ethoxy groups or both chlorine groups, and Rand Rare perfluorinated groups. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed, alone or with one or more similar compounds, to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making compounds of the general formula RMRRRare also disclosed.

A method comprises reacting a compound of the general formula R1 MOR3 wherein m is an integer from 2 to 4, R1 is selected from alkyl, alkenyl, aryl, alkynyl or epoxy, and wherein R1 is nonfluorinated, or fully or partially fluorinated; OR3 is alkoxy; and M is an element selected from group 14 of the periodic table; with a compound of the general formula R2M1 wherein R2 is selected from alkyl, alkenyl, aryl, alkynyl or epoxy, and wherein R2 is at least partially fluorinated; and M1 is an element from group I of the periodic table; so as to make a compound of the general formula R1 MOR3 R2. A similar method of the invention comprises reacting a compound of the general formula R1 MOR3 X wherein m is an integer from 2 to 4, and n is an integer from 0 to 3 and is not greater than m; R1 is selected from alkyl, alkenyl, aryl, alkynyl or epoxy, and wherein R1 is nonfluorinated, or fully or partially fluorinated; OR3 is alkoxy; X is a halogen; and M is an element selected from group 14 of the periodic table; with a compound of the general formula R2M1, wherein R2 is selected from alkyl, alkenyl, aryl, alkynyl or epoxy, and wherein R2 is at least partially fluorinated; and M1 is an element from group I of the periodic table; so as to make a compound of the general formula R2MR1 OR3 X . These compounds thus formed can be further reacted to attach an additional Rx group, or hydrolyzed, alone or with one or more similar compounds, to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components.

A method comprises reacting a compound of the general formula R MOR wherein m is an integer from 2 to 4, OR is an alkoxy group, and M is an element selected from group 14 of the periodic table; with a compound of the general formula R X &plus;Mg, wherein X is Br or I; where R and R are independently selected from alkyl, alkenyl, aryl, alkynyl, or epoxy, and wherein at least one of R and R is partially or fully fluorinated; so as to make a compound of the general formula R R MOR ; followed by reacting R R MOR with a halogen or halogen compound in order to replace one or more OR groups with a halogen group so as to form R R MOR X , where X is a halogen and n is from 1 to 3 and m<n&mdash;except where R is fluorinated phenyl, M is Si and OR is ethoxy. These compounds thus formed can be further reacted to attach an additional Rx group, or hydrolyzed, alone or with one or more similar compounds, to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components.

Growing community of inventors

Oulu, Finland

Arto L T Maaninen