Advanced Ceramics Corporation

Arthur William Moore

Michael Dowell

In accordance with the present invention at least two different grades of HOPG material with different d-spacings are combined to form a composite HOPG monochromator with increased spacing spread (&Dgr;d/d) defined by the combination of the two HOPG materials with each HOPG material oriented relative to one another so that their layer planes are parallel. The increased &Dgr;d/d should yield higher neutron beam intensities in certain types of backscattering instruments.

Pyrolytic graphite monocromator and method for improving lattice spacing spread of a pyrolytic graphite monocromator

A coated article of a stoichiometric coating composition of pyrolytic PB(Si)N on low thermal expansion carbon, graphite or ceramic materials and process of forming the coated article. The process involves introducing reactant vapors, under appropriate deposition conditions, within a heated furnace chamber containing the article to be coated. The reactant vapors are composed of ammonia, a gaseous source of boron and silicon and a diluent gas and are fed at a gas flow rate such that the combined flow rate of boron and silicon is less than the flow rate of ammonia.

Process for forming low thermal expansion pyrolytic nitride coatings on

This invention is directed to a method for shifting the mosaic spread of highly oriented pyrolytic graphite ('HOPG') into a preselected narrow range. The method involves selecting HOPG samples having a mosaic spread which lies below a desired mosaic spread range and cold working the selected samples to form a textured surface sufficent to shift the mosaic spread of the samples into the desired mosaic spread range. The textured surface is preferably imprinted by pressing the samples between metal dies with at least one of the dies having a knurled surface.

Adjustment of mosaic spread for highly oriented pyrolytic graphite

An improved interface coating for a fibrous material composed of a silicon-containing boron nitride having the general composition BSi.sub.x N.sub.1+1.33x, and containing from 2 wt % to 42 wt % of silicon, with substantially no free silicon present. The coating is formed by CVD using reactant vapors of ammonia and a gaseous source of both boron and silicon which flow into the furnace chamber at a controlled flow ratio to nitride the deposit to form the complex coating.

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Strongsville, OH, United States of America

Arthur William Moore