Globalfoundries Inc.

Arpan P Mohorowala

Kangguo Cheng

Carl John Radens

Ramachandra Divakaruni

Timothy Joseph Dalton

Dirk Pfeiffer

Katherina E Babich

Deok-kee Kim

Harald F Okorn-Schmidt

Kenneth T Settlemyer, Jr

Increased protection of areas of a chip are provided by both a mask structure of increased robustness in regard to semiconductor manufacturing processes or which can be removed with increased selectivity and controllability in regard to underlying materials, or both. Mask structures are provided which exhibit an interface of a chemical reaction, grain or material type which can be exploited to enhance either or both types of protection. Structures of such masks include TERA material which can be converted or hydrated and selectively etched using a mixture of hydrogen fluoride and a hygroscopic acid or organic solvent, and two layer structures of similar or dissimilar materials.

Methods and structures for protecting one area while processing another area on a chip

Growing community of inventors

Mount Krisco, NY, United States of America

Arpan P Mohorowala