Kla Tencor Corporation

Aron Abramowski Mason

Mei H Sun

Wayne Glenn Renken

Lynn Karl Wiese

At least one pair of capacitively coupled electrodes contained in a structure is used to sense the deflection of a diaphragm in a pressure or force sensor for measuring the pressure or force exerted on the diaphragm. Preferably the structure has properties (such as one or more of the following: dimensions, hardness, area and flexibility) that are substantially the same as those of a real substrate, such as a semiconductor wafer or flat panel display panel.

Pressure sensing device

At least one shear force sensor is used to measure the shear force on a member, when the member is in contact with and pressed against a polishing or planarization surface and a lateral force is applied between the two surfaces. Preferably the structure and the surface of the structure have properties (such as one or more of the following: dimensions and coefficient of friction) that are substantially the same as those of a real substrate, such as a semiconductor wafer or flat panel display panel.

Process condition measuring device and method for measuring shear force on a surface of a substrate that undergoes a polishing or planarization process

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San Mateo, CA, United States of America

Aron Abramowski Mason