Asml Netherlands B.v.

Arnout Johannes Meester

Ivo Adam Johannes Thomas

Marcio Alexandre Cano Miranda

Gheorghe Tanasa

Siebe Landheer

Hans Jansen

Richard Joseph Bruls

Bauke Jansen

Jeroen Peter Johannes Bruijstens

Laurentius Catrinus Jorritsma

Maurice Martinus Johannes Van Der Lee

Lambertus Dominicus Noordam

Klaus Simon

Henricus Wilhelmus Maria Van Buel

Joseph Consolini

Enno Van Den Brink

Gerardus Johannes Joseph Keijsers

Maurice Anton Jaques Teuwen

Hubertus Antonius Marinus Baijens

Johannes Theodoor De Smit

Richard Joseph Travers

Frederick William Hafner

Vinyu Greenlee

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

Lithographic apparatus and method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.

Lithographic apparatus and method

Growing community of inventors

Eindhoven, Netherlands

Arnout Johannes Meester