Asml Netherlands B.v.

Asml Holding N.v.

Arnoud Willem Notenboom

Pieter-Jan Van Zwol

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Paul Janssen

Willem-Pieter Voorthuijzen

Johannes Petrus Martinus Bernardus Vermeulen

Derk Servatius Gertruda Brouns

Willem Joan Van Der Zande

Adrianus Johannes Maria Giesbers

Evgenia Kurganova

Marcus Adrianus Van De Kerkhof

Johan Hendrik Klootwijk

James Norman Wiley

Aleksandar Nikolov Zdravkov

Erik Achilles Abegg

Matthias Kruizinga

Ties Wouter Van Der Woord

Pradeep Kumar Govil

Dennis De Graaf

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Aage Bendiksen

Hendrikus Jan Wondergem

Peter Simon Antonius Knapen

Andrey Alexandrovich Nikipelov

Antonius Franciscus Johannes De Groot

Egbert Lenderink

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Robertus Cornelis Martinus De Kruif

Hrishikesh Patel

Gijsbert Rispens

Gerrit Van Den Bosch

Nadja Schuh

Nirupam Banerjee

Chaitanya Krishna Ande

Michiel Alexander Blauw

Daniel Andrew Smith

Antonius Willem Verburg

Leonid Aizikovitsj Sjmaenok

Nicolae Maxim

Claudia Piliego

Johannes Joseph Janssen

Marcel Peter Meijer

Wouter Rogier Meijerink

Raymond Olsman

Ronald Van Der Wilk

Roger Wilhelmus Antonius Henricus Schmitz

Alexander Ludwig Klein

Manon Elise Will

Maria Peter

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Noud Jan Gilissen

Jim Vincent Overkamp

Johannes Christiaan Leonardus Franken

Bastiaan Matthias Mertens

Koos Van Berkel

Sebastiaan Maria Johannes Cornelissen

Johannes Adrianus Cornelis Maria Pijnenburg

Alexey Sergeevich Kuznetsov

Jeroen Van Duivenbode

Anko Jozef Cornelus Sijben

Mahdiar Valefi

Jan Hendrik Willem Kuntzel

Sander Baltussen

Kjeld Gertrudus Hendrikus Janssen

Maxime Biron

Johannes Bernardus Charles Engelen

Anton Wilhelmus Duys

Inci Donmez Noyan

Erik Johannes Nieuwenhuis

Lourdes Ferre Llin

Anne-Sophie Rollier

Petrus Augustinus Franciscus Klomp

Sten Vollebregt

Derk Servatius Brouns

Beatrijs Louise Verbrugge

Robertus Cornelis De Kruif

Alexandar Nikolov Zdravkov

Pradeep K Govil

Mária PÉTER

Bastiaan Mertens

Petrus Klomp

Bas Cornelissen

Anko Sijben

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.

Pellicle membrane

An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

Object holder, tool and method of manufacturing an object holder

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

Metal-silicide-nitridation for stress reduction

A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.

Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Mask assembly and associated methods

A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.

Graphene pellicle lithographic apparatus

A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.

Pellicle frame and pellicle assembly

Growing community of inventors

Rosmalen, Netherlands

Arnoud Willem Notenboom