Asml Netherlands B.v.

Arnoud Cornelis Wassink

Vadim Yevgenyevich Banine

Levinus Pieter Bakker

Paul Peter Anna Antonius Brom

Johannes Hubertus Josephina Moors

Maarten Marinus Johannes Wilhelmus Van Herpen

Frank Jeroen Pieter Schuurmans

Johannes Christiaan Leonardus Franken

Josephus Jacobus Smits

Leonid Aizikovitch Sjmaenok

Alexander Alexandrovitch Schmidt

Eric Louis Willem Verpalen

Antonius Johannes Van De Pas

Christiaan Alexander Hoogendam

Derk Jan Wilfred Klunder

Theodorus Petrus Maria Cadee

Wouter Anthon Soer

Vladimir Vitalevitch Ivanov

Erik Theodorus Maria Bijlaart

Edwin Johan Buis

Konstantin Nikolaevitch Koshelev

Vladimir Mihailovitch Krivtsun

Carolus Ida Maria Antonius Spee

Alexander Matthijs Struycken

Lambertus Adrianus Van Den Wildenberg

Lambertus Adrianus Van De Wildenberg

Derk Jan Wildred Klunder

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

Illumination system and filter system

A contamination prevention system constructed and arranged to prevent material emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The contamination prevention system includes a channel barrier constructed and arranged to traverse the radiation from the radiation source. The channel barrier includes a plurality of elongated channel members constructed and arranged to absorb or deflect the material. The channel members are rotatable around an axis of rotation by a drive connected to the channel barrier. The contamination prevention system also includes a cooling system provided on an outer surface of the channel barrier.

Contamination prevention system, a lithographic apparatus, a radiation source and a method for manufacturing a device

A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for filtering debris particles out of the radiation beam, and an illumination system configured to condition a radiation beam. A projection system is configured to project the projection beam of radiation onto a substrate. The filter system includes a plurality of foils for trapping the debris particles. At least one foil includes at least two parts that have a mutually different orientation and that are connected to each other along a substantially straight connection line. Each of the two parts substantially coincide with a virtual plane that extends through a predetermined position that substantially coincides with the radiation source. The straight connection substantially line coincides with a virtual straight line that also extends through the predetermined position.

Lithographic apparatus and radiation system

A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

Apparatus comprising a rotating contaminant trap

A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Radiation system and lithographic apparatus

A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Lithographic apparatus, contaminant trap, and device manufacturing method

A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.

Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device

Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system

A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.

Contamination barrier and lithographic apparatus comprising same

A rotatable contamination barrier is disclosed. The barrier includes a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source. The blades are oriented radially relative to a central rotation axis of the contamination barrier. The contamination barrier is segmented in an inner segment and an outer segment relative to the central rotation axis. Accordingly, higher revolution speeds may be attained without compromising the contamination barrier.

Contamination barrier and lithographic apparatus

Lithographic apparatus, illumination system and filter system

A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

A filter system for filtering debris particles out of a predetermined cross-section of the radiation emitted by a radiation source of a lithographic apparatus includes a first set of foils and a second set of foils for trapping the debris particles, and a first heat sink and a second heat sink. Each foil of the first set is thermally connected to the first heat sink, and each foil of the second set is thermally connected to the second heat sink, so that heat is conducted substantially towards the first heat sink through each foil of the first set, and heat is conducted substantially towards the second heat sink through each foil of the second set. The first set extend substantially in a first section of the predetermined cross-section, and the second set extend substantially in a second section of the predetermined cross-section. The first and second sections are substantially non-overlapping.

Lithographic apparatus, radiation system and filter system

A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.

Growing community of inventors

Veldhoven, Netherlands

Arnoud Cornelis Wassink