Eaton Corporation

Arnold Weiss

Herman P Schutten

Gordon B Spellman

Stanley V Jaskolski

Louis Cartz

Peter H Wackman, Deceased

An active inertial isolation system is disclosed generally for any inertial body, and also for bodies subject to structural resonance, and further particularly for a microlithography system (2) for processing semiconductor wafers (4) subject to a submicron design rule. One or more linear forcers (94, 76, 74, 94' 76', FIGS. 18 and 19) are provided for applying a force between the body or worktable (6) and a reaction mass RM (202, 204, 206, 210). One or more accelerometers (98, 78) sense acceleration of the body (6) and apply force against sensed acceleration regardless of the position or variation of position of the body (6) relative to the reaction mass RM. The reaction mass RM may be supported relative to the linear forcer, and/or be a part thereof or rigidly fixed thereto, or the reaction mass RM may be supported relative to a reference such as a sidewall or the floor.

Seismic isolation system with reaction mass

A method is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions.

Plasma pinch X-ray method

A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions. Common electrode structure is provided for plasma generating and for plasma pinching, which common electrode also provides a cylindrical plasma communication passage from the first to the second area, and provides an X-ray emission passage of desired axial orientation.

X-ray lithography system

Plasma pinch X-ray apparatus

A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma vapor is repeatably generated directly from solid material by impingement of a plurality of circumferentially spaced laser beams to generate an annulus of plasma. X-rays are generated by passing high current through the annular plasma in an axial gap between the solid material target electrode and another electrode, causing magnetic field radial inward plasma pinching to a central constricted area further heating the plasma and emitting X-rays. A central axially directed laser may further heat the plasma in the pinched area.

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Minneapolis, MN, United States of America

Arnold Weiss