Asml Netherlands B.v.

Arnold Jan Van Putten

Daniel Jozef Maria Direcks

Danny Maria Hubertus Philips

Koen Steffens

Clemens Johannes Gerardus Van Den Dungen

Nicolaas Rudolf Kemper

Michel Riepen

Johannes Petrus Martinus Bernardus Vermeulen

Han-Kwang Nienhuys

Bernardus Antonius Johannes Luttikhuis

Paul Petrus Joannes Berkvens

Maikel Adrianus Cornelis Schepers

Kursat Bal

David Christopher Ockwell

Maikel Bernardus Theodorus Leenders

Danny Philips

A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Lithographic apparatus

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method

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Eindhoven, Netherlands

Arnold Jan Van Putten